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Fizika i Tekhnika Poluprovodnikov, 2017, Volume 51, Issue 8, Pages 1018–1020
DOI: https://doi.org/10.21883/FTP.2017.08.44776.45
(Mi phts6056)
 

This article is cited in 1 scientific paper (total in 1 paper)

XV International Conference ''Thermoelectrics and Their Applications-2016 St. Petersburg'', November 15-16, 2016

Response of thermoelectric parameters of Bi$_{0.5}$Sb$_{1.5}$Te$_{3}$ films to secondary recrystallization

Yu. A. Boikov, V. A. Danilov

Ioffe Institute, St. Petersburg
Full-text PDF (154 kB) Citations (1)
Abstract: Flash evaporation is used to grow Bi$_{0.5}$Sb$_{1.5}$Te$_{3}$ films 1200 nm thick on mica substrates. The average lateral crystallite sizes in the as-grown films are $\sim$800 nm. The (0001) plane in the crystallites is preferentially parallel to the substrate plane. After heat treatment in an argon atmosphere, the effective lateral size of crystallites in which the third-order axis is perpendicular to the substrate plane increased by a factor of 3–5. The crystallites were preferentially oriented in the substrate plane as well. The thermoelectric-power parameter of Bi$_{0.5}$Sb$_{1.5}$Te$_{3}$ films after their heat treatment in an inert environment increased approximately twofold to values close to that of the corresponding single crystals.
Received: 31.01.2017
Accepted: 15.02.2017
English version:
Semiconductors, 2017, Volume 51, Issue 8, Pages 976–978
DOI: https://doi.org/10.1134/S1063782617080048
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: Yu. A. Boikov, V. A. Danilov, “Response of thermoelectric parameters of Bi$_{0.5}$Sb$_{1.5}$Te$_{3}$ films to secondary recrystallization”, Fizika i Tekhnika Poluprovodnikov, 51:8 (2017), 1018–1020; Semiconductors, 51:8 (2017), 976–978
Citation in format AMSBIB
\Bibitem{BoiDan17}
\by Yu.~A.~Boikov, V.~A.~Danilov
\paper Response of thermoelectric parameters of Bi$_{0.5}$Sb$_{1.5}$Te$_{3}$ films to secondary recrystallization
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2017
\vol 51
\issue 8
\pages 1018--1020
\mathnet{http://mi.mathnet.ru/phts6056}
\crossref{https://doi.org/10.21883/FTP.2017.08.44776.45}
\elib{https://elibrary.ru/item.asp?id=29938269}
\transl
\jour Semiconductors
\yr 2017
\vol 51
\issue 8
\pages 976--978
\crossref{https://doi.org/10.1134/S1063782617080048}
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  • https://www.mathnet.ru/eng/phts/v51/i8/p1018
  • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    Fizika i Tekhnika Poluprovodnikov Fizika i Tekhnika Poluprovodnikov
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