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This article is cited in 4 scientific papers (total in 4 papers)
XXI International Symposium ''Nanophysics And Nanoelectronics'', Nizhny Novgorod, March 13-16, 2017
Semiconductor structures with a one-dimensional quantum channel and in-plane side gates fabricated by pulse force nanolithography
V. I. Borisova, N. A. Kuvshinovaa, S. P. Kurochkab, V. E. Sizova, M. V. Stepushkinab, A. G. Temiryazeva a Kotelnikov Institute of Radioengineering and Electronics, Fryazino Branch, Russian Academy of Sciences
b National University of Science and Technology «MISIS», Moscow
Abstract:
Quasi-one-dimensional semiconductor structures with a variable longitudinal potential profile are fabricated by pulse power nanolithography, which is carried out using an atomic force microscope. Structures are fabricated on the basis of AlGaAs/GaAs heterostructures with a deep (130 nm from the surface) twodimensional electron gas. The channel potential profile is formed with the help of sectioned in-plane gates formed on both channel sides. The electrical parameters of the structures measured at temperatures down to 1.5 K confirmed the efficiency of the applied method to fabricate insulating regions with lateral sizes of $\sim$10 nm.
Received: 27.04.2017 Accepted: 12.05.2017
Citation:
V. I. Borisov, N. A. Kuvshinova, S. P. Kurochka, V. E. Sizov, M. V. Stepushkin, A. G. Temiryazev, “Semiconductor structures with a one-dimensional quantum channel and in-plane side gates fabricated by pulse force nanolithography”, Fizika i Tekhnika Poluprovodnikov, 51:11 (2017), 1534–1537; Semiconductors, 51:11 (2017), 1481–1484
Linking options:
https://www.mathnet.ru/eng/phts6003 https://www.mathnet.ru/eng/phts/v51/i11/p1534
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