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This article is cited in 4 scientific papers (total in 4 papers)
XXI International Symposium ''Nanophysics And Nanoelectronics'', Nizhny Novgorod, March 13-16, 2017
Technology of the production of laser diodes based on GaAs/InGaAs/AlGaAs structures grown on a Ge/Si substrate
V. Ya. Aleshkinab, N. V. Baidusab, A. A. Dubinovab, K. E. Kudryavtsevab, S. M. Nekorkina, A. V. Novikovab, A. V. Rykova, I. V. Samartseva, A. G. Fefelovc, D. V. Yurasovab, Z. F. Krasil'nikab a Lobachevsky State University of Nizhny Novgorod
b Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
c NPP "Salyut"
Abstract:
InGaAs/GaAs/AlGaAs laser diodes with quantum wells are grown by the metal-organic chemical vapor deposition (MOCVD) method on an exact Si (001) substrate with a Ge buffer layer. The diodes generate stimulated emission in the pulsed mode at room temperature in the spectral range from 1.09 to 1.11 $\mu$m.
Received: 15.05.2017 Accepted: 31.05.2017
Citation:
V. Ya. Aleshkin, N. V. Baidus, A. A. Dubinov, K. E. Kudryavtsev, S. M. Nekorkin, A. V. Novikov, A. V. Rykov, I. V. Samartsev, A. G. Fefelov, D. V. Yurasov, Z. F. Krasil'nik, “Technology of the production of laser diodes based on GaAs/InGaAs/AlGaAs structures grown on a Ge/Si substrate”, Fizika i Tekhnika Poluprovodnikov, 51:11 (2017), 1530–1533; Semiconductors, 51:11 (2017), 1477–1480
Linking options:
https://www.mathnet.ru/eng/phts6002 https://www.mathnet.ru/eng/phts/v51/i11/p1530
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