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This article is cited in 2 scientific papers (total in 2 papers)
Manufacturing, processing, testing of materials and structures
On a new mechanism for the realization of ohmic contacts
A. V. Sachenko, A. E. Belyaev, R. V. Konakova Institute of Semiconductor Physics NAS, Kiev
Abstract:
Analysis of the contact-barrier height taking into account the distribution of surface states along coordinate $x$ perpendicular to the insulator–semiconductor interface is performed for metal–semiconductor contacts with a dielectric gap. It is shown that taking into account the spatial dependence of the density of surface states at rather high semiconductor doping levels leads to a substantial decrease in the barrier height, which promotes the realization of ohmic contacts. It is established that the smaller the metal–semiconductor contact potential difference $\varphi_{ms}$, the stronger the effect of barrier-height lowering. If $\varphi_{ms}$ is negative, this effect can lead to potential sign reversal, i.e., to the realization of an enrichment layer in the space-charge region of the semiconductor even at a high density of surface states. This in turn promotes the manifestation of an anomalous dependence of the contact resistivity on temperature; the resistivity increases with an increase in temperature.
Received: 07.06.2017 Accepted: 08.06.2017
Citation:
A. V. Sachenko, A. E. Belyaev, R. V. Konakova, “On a new mechanism for the realization of ohmic contacts”, Fizika i Tekhnika Poluprovodnikov, 52:1 (2018), 138–142; Semiconductors, 52:1 (2018), 131–135
Linking options:
https://www.mathnet.ru/eng/phts5955 https://www.mathnet.ru/eng/phts/v52/i1/p138
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Abstract page: | 40 | Full-text PDF : | 17 |
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