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This article is cited in 4 scientific papers (total in 4 papers)
Electronic properties of semiconductors
Formation of radiation defects by proton braking in lightly doped $n$- and $p$-SiC layers
V. V. Kozlovskya, A. È. Vasil'eva, P. A. Karaseova, A. A. Lebedevb a Peter the Great St. Petersburg Polytechnic University
b Ioffe Institute, St. Petersburg
Abstract:
Mathematical simulation of the cascade of displacements in SiC is used to consider the specific features of Frenkel-pair generation upon the scattering of 8- and 15-MeV protons. The distribution histograms of energies acquired not only by primary knocked-out atoms, but also by recoil atoms generated in displacement cascades, are calculated. An analysis of the histograms considers two energy ranges. In the first range of “low” energies, the spontaneous recombination of genetically related Frenkel pairs is dominant. Recoil atoms in the second range have a higher energy, which enables these atoms to leave the spontaneousrecombination zone and dissociate into isolated components. The compensation of lightly doped $n$- and $p$-4$H$-SiC samples grown by gas-phase epitaxy is experimentally studied under irradiation with 8- and 15-MeV protons. The carrier removal rates are measured. The calculated and experimental data are compared and estimates are obtained for the size of the spontaneous-recombination zone.
Received: 09.10.2017 Accepted: 18.10.2017
Citation:
V. V. Kozlovsky, A. È. Vasil'ev, P. A. Karaseov, A. A. Lebedev, “Formation of radiation defects by proton braking in lightly doped $n$- and $p$-SiC layers”, Fizika i Tekhnika Poluprovodnikov, 52:3 (2018), 327–332; Semiconductors, 52:3 (2018), 310–315
Linking options:
https://www.mathnet.ru/eng/phts5892 https://www.mathnet.ru/eng/phts/v52/i3/p327
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