Fizika i Tekhnika Poluprovodnikov
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS



Fizika i Tekhnika Poluprovodnikov:
Year:
Volume:
Issue:
Page:
Find






Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register


Fizika i Tekhnika Poluprovodnikov, 2018, Volume 52, Issue 5, Page 523 (Mi phts5849)  

This article is cited in 4 scientific papers (total in 4 papers)

XXV International Symposium ''Nanostructures: Physics and Technology'', Saint Petersburg, June 26-30, 2017
Nanostructure Technology

Effect of epitaxial alignment on electron transport from quasi-two-dimensional iron silicide $\alpha$-FeSi$_{2}$ nanocrystals into $p$-Si(001)

I. A. Tarasov, M. V. Rautskii, I. A. Yakovlev, M. N. Volochaev

Kirensky Institute of Physics, Federal Research Centre KSC, Siberian Branch of the Russian Academy of Sciences, 660036 Krasnoyarsk, Russia
Full-text PDF (30 kB) Citations (4)
Abstract: Self-assembled growth of $\alpha$-FeSi$_{2}$ nanocrystal ensembles on gold-activated and gold-free Si(001) surface by molecular beam epitaxy is reported. The microstructure and basic orientation relationship (OR) between the silicide nanocrystals and silicon substrate were analysed. The study reveals that utilisation of the gold as catalyst regulates the preferable OR of the nanocrystals with silicon and their habitus. It is shown that electron transport from $\alpha$-FeSi$_{2}$ phase into $p$-Si(001) can be tuned by the formation of (001)–or (111)–textured $\alpha$-FeSi$_{2}$ nanocrystals ensembles. A current-voltage characteristic of the structures with different preferable epitaxial alignment ($\alpha$-FeSi$_{2}$(001)/Si(100) and $\alpha$-FeSi$_{2}$(111)/Si(100)) shows good linearity at room temperature. However, it becomes non-linear at different temperatures for different ORs due to different Schottky barrier height governed by a particular epitaxial alignment of the $\alpha$-FeSi$_{2}$/$p$-Si interfaces.
Funding agency Grant number
Russian Foundation for Basic Research 16-42-243060
16-42-243035
17-42-190308
The work was supported by the Russian Foundation for Basic Research, Government of Krasnoyarsk Territory, Krasnoyarsk Region Science and Technology Support Fund to the research projects No 16-42-243060 and 16-42-243035 and Russian Foundation for Basic Research, Government of The Republic of Khakassia, research project No 17-42-190308.
English version:
Semiconductors, 2018, Volume 52, Issue 5, Pages 654–659
DOI: https://doi.org/10.1134/S1063782618050330
Bibliographic databases:
Document Type: Article
Language: English
Citation: I. A. Tarasov, M. V. Rautskii, I. A. Yakovlev, M. N. Volochaev, “Effect of epitaxial alignment on electron transport from quasi-two-dimensional iron silicide $\alpha$-FeSi$_{2}$ nanocrystals into $p$-Si(001)”, Fizika i Tekhnika Poluprovodnikov, 52:5 (2018), 523; Semiconductors, 52:5 (2018), 654–659
Citation in format AMSBIB
\Bibitem{TarRauYak18}
\by I.~A.~Tarasov, M.~V.~Rautskii, I.~A.~Yakovlev, M.~N.~Volochaev
\paper Effect of epitaxial alignment on electron transport from quasi-two-dimensional iron silicide $\alpha$-FeSi$_{2}$ nanocrystals into $p$-Si(001)
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2018
\vol 52
\issue 5
\pages 523
\mathnet{http://mi.mathnet.ru/phts5849}
\elib{https://elibrary.ru/item.asp?id=32740387}
\transl
\jour Semiconductors
\yr 2018
\vol 52
\issue 5
\pages 654--659
\crossref{https://doi.org/10.1134/S1063782618050330}
Linking options:
  • https://www.mathnet.ru/eng/phts5849
  • https://www.mathnet.ru/eng/phts/v52/i5/p523
  • This publication is cited in the following 4 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Fizika i Tekhnika Poluprovodnikov Fizika i Tekhnika Poluprovodnikov
    Statistics & downloads:
    Abstract page:28
    Full-text PDF :8
     
      Contact us:
     Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2024