|
This article is cited in 2 scientific papers (total in 2 papers)
Manufacturing, processing, testing of materials and structures
Concentric hexagonal GaN structures for nanophotonics, fabricated by selective vapor-phase epitaxy with ion-beam etching
M. I. Mitrofanovab, Ya. V. Levitskiiab, G. V. Voznyukc, E. E. Tatarinovc, S. N. Rodinab, M. A. Kaliteevskiiacd, V. P. Evtikhieva a Ioffe Institute, St. Petersburg
b Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences, St. Petersburg
c St. Petersburg National Research University of Information Technologies, Mechanics and Optics
d Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
Abstract:
In the Si$_3$N$_4$ layer, coaxial and single submicrometer GaN structures of hexagonal shape with pyramidal facets are formed by selective vapor-phase epitaxy in windows produced with a focused ion beam. It is found that coaxial hexagonal structures are formed during the growth process in ring-shaped mask windows.
Received: 18.12.2017 Accepted: 18.12.2017
Citation:
M. I. Mitrofanov, Ya. V. Levitskii, G. V. Voznyuk, E. E. Tatarinov, S. N. Rodin, M. A. Kaliteevskii, V. P. Evtikhiev, “Concentric hexagonal GaN structures for nanophotonics, fabricated by selective vapor-phase epitaxy with ion-beam etching”, Fizika i Tekhnika Poluprovodnikov, 52:7 (2018), 816–818; Semiconductors, 52:7 (2018), 954–956
Linking options:
https://www.mathnet.ru/eng/phts5796 https://www.mathnet.ru/eng/phts/v52/i7/p816
|
Statistics & downloads: |
Abstract page: | 36 | Full-text PDF : | 12 |
|