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This article is cited in 4 scientific papers (total in 4 papers)
Micro- and nanocrystalline, porous, composite semiconductors
Simulation of electron and hole states in Si nanocrystals in a SiO$_{2}$ matrix: choice of parameters of the empirical tight-binding method
A. V. Belolipetskiy, M. O. Nestoklon, I. N. Yassievich Ioffe Institute, St. Petersburg
Abstract:
The problem of the optimal choice of parameters of the empirical tight-binding method to simulate the quantum-confined levels of Si nanocrystals embedded into an amorphous SiO$_{2}$ matrix is studied. To account for tunneling from nanocrystals to SiO$_{2}$, the amorphous matrix is considered as a virtual crystal with a band structure similar to that of SiO$_{2}$ $\beta$-cristobalite and with a lattice constant matched to the lattice constant of bulk Si. The electron density distributions in $\mathbf{k}$ space for electrons and holes quantum-confined in a Si nanocrystal in SiO$_{2}$ are calculated in a wide energy region, which provides a means to see clearly the possibility of the existence of efficient direct optical transitions for hot electrons at the upper quantum-confined levels.
Received: 12.03.2018 Accepted: 19.03.2018
Citation:
A. V. Belolipetskiy, M. O. Nestoklon, I. N. Yassievich, “Simulation of electron and hole states in Si nanocrystals in a SiO$_{2}$ matrix: choice of parameters of the empirical tight-binding method”, Fizika i Tekhnika Poluprovodnikov, 52:10 (2018), 1145–1149; Semiconductors, 52:10 (2018), 1264–1268
Linking options:
https://www.mathnet.ru/eng/phts5708 https://www.mathnet.ru/eng/phts/v52/i10/p1145
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