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Fizika i Tekhnika Poluprovodnikov, 2019, Volume 53, Issue 8, Pages 1086–1094
DOI: https://doi.org/10.21883/FTP.2019.08.48000.9129
(Mi phts5434)
 

Semiconductor structures, low-dimensional systems, quantum phenomena

Energy expenditure upon the formation of the elastically stressed state in the layers of a step-graded metamorphic buffer in a heterostructure grown on a (001) GaAs substrate

A. N. Aleshina, A. S. Bugaeva, O. A. Rubana, V. V. Saraikina, N. Yu. Tabachkovab, I. V. Shchetininb

a V. G. Mokerov Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow
b National University of Science and Technology «MISIS», Moscow
Abstract: On the basis of data on X-ray structural analysis performed by the method of reciprocal-space mapping and investigations using secondary-ion mass spectrometry and transmission electron microscopy, it is shown that vertical compressive stresses also arise in a multilayer epitaxial heterostructure comprised of a step-graded metamorphic buffer along with lateral compressive stresses. The cause of the appearance of vertical stresses is the effect of interlayer hardening, which arises due to the deceleration of fragments of glide dislocations by interphase boundaries. Analysis performed within the framework of the linear theory of elasticity shows that the elastically stressed state of the buffer steps is similar to the state that can be achieved as a result of a two-stage deformation process: bulk and biaxial compression. Bulk compression leads to large energy expenditures in the formation of the structure of the buffer steps, which is reflected, in particular, in violation of the coherence between the dislocation-free and the underlying layers.
Keywords: heterostructure, metamorphic buffer, compressive stress, two-stage deformation process, energy expenditures.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation 075-00816-19-00
The work was performed as part of the State Task for 2019 no. 075-00816-19-00 of December 27, 2018, for the Institute of Ultrahigh Frequency Semiconductor Electronics, Russian Academy of Sciences.
Received: 04.04.2019
Revised: 12.04.2019
Accepted: 12.04.2019
English version:
Semiconductors, 2019, Volume 53, Issue 8, Pages 1066–1074
DOI: https://doi.org/10.1134/S1063782619080025
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. N. Aleshin, A. S. Bugaev, O. A. Ruban, V. V. Saraikin, N. Yu. Tabachkova, I. V. Shchetinin, “Energy expenditure upon the formation of the elastically stressed state in the layers of a step-graded metamorphic buffer in a heterostructure grown on a (001) GaAs substrate”, Fizika i Tekhnika Poluprovodnikov, 53:8 (2019), 1086–1094; Semiconductors, 53:8 (2019), 1066–1074
Citation in format AMSBIB
\Bibitem{AleBugRub19}
\by A.~N.~Aleshin, A.~S.~Bugaev, O.~A.~Ruban, V.~V.~Saraikin, N.~Yu.~Tabachkova, I.~V.~Shchetinin
\paper Energy expenditure upon the formation of the elastically stressed state in the layers of a step-graded metamorphic buffer in a heterostructure grown on a (001) GaAs substrate
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2019
\vol 53
\issue 8
\pages 1086--1094
\mathnet{http://mi.mathnet.ru/phts5434}
\crossref{https://doi.org/10.21883/FTP.2019.08.48000.9129}
\elib{https://elibrary.ru/item.asp?id=41129836}
\transl
\jour Semiconductors
\yr 2019
\vol 53
\issue 8
\pages 1066--1074
\crossref{https://doi.org/10.1134/S1063782619080025}
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