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This article is cited in 1 scientific paper (total in 1 paper)
XXIII International symposium ''Nanophysics and Nanoelectronics'', Nizhny Novgorod, March 11–14, 2019
Numerical simulation of the current–voltage characteristics of bilayer resistive memory based on non-stoichiometric metal oxides
G. M. Umnyagin, V. E. Degtyarov, S. V. Obolensky Lobachevsky State University of Nizhny Novgorod
Abstract:
The current–voltage characteristics of a resistive-memory structure based on non-stoichiometric tantalum oxides is numerically simulated. The results of pulsed studies of structures with different shapes of the conductive filament, such as a truncated cone with different generatrix inclination angles, are presented. It is shown how the shape and total volume of the conductive filament affects the current amplitude and the number of pulses necessary for complete filament breaking and restoration.
Keywords:
resistive memory, non-stoichiometric, numerical simulation.
Received: 24.04.2019 Revised: 29.04.2019 Accepted: 29.04.2019
Citation:
G. M. Umnyagin, V. E. Degtyarov, S. V. Obolensky, “Numerical simulation of the current–voltage characteristics of bilayer resistive memory based on non-stoichiometric metal oxides”, Fizika i Tekhnika Poluprovodnikov, 53:9 (2019), 1275–1278; Semiconductors, 53:9 (2019), 1246–1248
Linking options:
https://www.mathnet.ru/eng/phts5416 https://www.mathnet.ru/eng/phts/v53/i9/p1275
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