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This article is cited in 4 scientific papers (total in 4 papers)
XXIII International symposium ''Nanophysics and Nanoelectronics'', Nizhny Novgorod, March 11–14, 2019
In-situ doping of thermoelectric materials based on SiGe solid solutions during their synthesis by the spark plasma sintering technique
M. V. Dorokhina, P. B. Deminaa, I. V. Erofeevaa, A. V. Zdoroveyshcheva, Yu. M. Kuznetsova, M. S. Boldina, A. A. Popova, E. A. Lantseva, A. V. Boryakovb a Scientific-Research Physicotechnical Institute at the Nizhnii Novgorod State University, Nizhnii Novgorod
b Lobachevsky State University of Nizhny Novgorod
Abstract:
The results of investigation of thermoelectric materials fabricated by spark plasma sintering and based on Si$_{1-x}$Ge$_ x$ solid solutions doped with Sb to a concentration of 0–5 at % are presented. It was found that, at Sb concentration below 1 at %, efficient doping of the solid solution was carried out during the sintering process, which allowed us to form a thermoelectric material with a relatively high thermoelectric figure of merit. An increase in the concentration of antimony in the range of 1–5 at % led to a change in the mechanism of doping, which resulted in an increase in the resistance of materials and the segregation of Sb into large clusters. For such materials, a significant decrease in the Seebeck coefficient and thermoelectric figure of merit was noted. The highest obtained thermoelectric figure of merit (ZT) with Sb doping was 0.32 at 350$^{\circ}$C, which is comparable with known analogues for the Ge$_ x$ Si$_{1-x}$ solid solution.
Keywords:
thermoelectricity, Si$_{1-x}$Ge$_x$ solid solution, doping, clusters, Sb, plasma sintering.
Received: 24.04.2019 Revised: 29.04.2019 Accepted: 29.04.2019
Citation:
M. V. Dorokhin, P. B. Demina, I. V. Erofeeva, A. V. Zdoroveyshchev, Yu. M. Kuznetsov, M. S. Boldin, A. A. Popov, E. A. Lantsev, A. V. Boryakov, “In-situ doping of thermoelectric materials based on SiGe solid solutions during their synthesis by the spark plasma sintering technique”, Fizika i Tekhnika Poluprovodnikov, 53:9 (2019), 1182–1188; Semiconductors, 53:9 (2019), 1158–1163
Linking options:
https://www.mathnet.ru/eng/phts5399 https://www.mathnet.ru/eng/phts/v53/i9/p1182
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