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Amorphous, glassy, organic semiconductors
Structural and dielectric study of thin amorphous layers of the Ge–Sb–Te system prepared by RF magnetron sputtering
R. A. Castro-Arataa, V. M. Stozharova, D. M. Dolginseva, A. A. Kononova, Yu. Saitob, P. Fonsb, J. Tominagab, N. I. Anisimovaa, A. V. Kolobova a Herzen State Pedagogical University of Russia, St. Petersburg
b National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1 Higashi, 305-8565, Tsukuba, Japan
Abstract:
The results of studying the structure and processes of dielectric relaxation in thin layers of Ge–Sb–Te are presented. The found permittivity dispersion and occurrence of dielectric-loss maxima in the low-frequency region are explained by the structural features of the compounds under study.
Keywords:
structural and dielectric properties, Ge–Sb–Te chalcogenide system.
Received: 15.10.2019 Revised: 23.10.2019 Accepted: 23.10.2019
Citation:
R. A. Castro-Arata, V. M. Stozharov, D. M. Dolginsev, A. A. Kononov, Yu. Saito, P. Fons, J. Tominaga, N. I. Anisimova, A. V. Kolobov, “Structural and dielectric study of thin amorphous layers of the Ge–Sb–Te system prepared by RF magnetron sputtering”, Fizika i Tekhnika Poluprovodnikov, 54:2 (2020), 149–152; Semiconductors, 54:2 (2020), 201–204
Linking options:
https://www.mathnet.ru/eng/phts5278 https://www.mathnet.ru/eng/phts/v54/i2/p149
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Abstract page: | 44 | Full-text PDF : | 11 |
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