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This article is cited in 2 scientific papers (total in 2 papers)
Micro- and nanocrystalline, porous, composite semiconductors
Ohmic contacts to gallium nitride-based structures
A. V. Zhelannova, A. S. Ionova, B. I. Seleznevb, D. G. Fedorova a JSC OKB-Planeta, Velikii Novgorod
b Yaroslav-the-Wise Novgorod State University
Abstract:
Studies of the characteristics of ohmic contacts to epitaxial and ion-doped gallium-nitride layers, based on the Cr/Pt/Au metallization system, are reported. The possibility of forming low-resistance contacts without the application of high-temperature treatment is shown. It is demonstrated, for AlGaN/GaN-based heterostructures, that the characteristics of Ti/Al/Ni/Au ohmic contacts are improved upon using ion implantation through a silicon-dioxide mask.
Keywords:
Heterostructure, gallium nitride, ohmic contact, metallization system, ion implantation, fast thermal annealing, specific contact resistance.
Received: 23.07.2019 Revised: 03.09.2019 Accepted: 05.11.2019
Citation:
A. V. Zhelannov, A. S. Ionov, B. I. Seleznev, D. G. Fedorov, “Ohmic contacts to gallium nitride-based structures”, Fizika i Tekhnika Poluprovodnikov, 54:3 (2020), 246–250; Semiconductors, 54:3 (2020), 317–321
Linking options:
https://www.mathnet.ru/eng/phts5260 https://www.mathnet.ru/eng/phts/v54/i3/p246
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Abstract page: | 71 | Full-text PDF : | 31 |
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