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Semiconductor structures, low-dimensional systems, quantum phenomena
Dependence of the electrophysical characteristics of metal–ferroelectric–semiconductor structures on the field-electrode material
M. S. Afanasieva, D. A. Belorusova, D. A. Kiselevab, A. A. Sivova, G. V. Chuchevaa a Kotelnikov Institute of Radioengineering and Electronics, Fryazino Branch, Russian Academy of Sciences
b National University of Science and Technology «MISIS», Moscow
Abstract:
Films of the composition Ba$_{0.8}$Sr$_{0.2}$TiO$_{3}$ (BST 80/20) are synthesized on a silicon substrate by the method of the high-frequency sputtering of a polycrystalline target. The results of investigations of the film composition, the electrophysical properties of capacitor structures based on them, and the dependence of these properties on the material (Al, Cu, Ni, Cr) of the upper electrode are presented.
Keywords:
metal–dielectric–semiconductor structures, ferroelectric films of Ba$_{0.8}$Sr$_{0.2}$TiO$_{3}$ composition, microstructure, electrophysical properties.
Received: 08.06.2020 Revised: 13.07.2020 Accepted: 13.07.2020
Citation:
M. S. Afanasiev, D. A. Belorusov, D. A. Kiselev, A. A. Sivov, G. V. Chucheva, “Dependence of the electrophysical characteristics of metal–ferroelectric–semiconductor structures on the field-electrode material”, Fizika i Tekhnika Poluprovodnikov, 54:11 (2020), 1219–1223; Semiconductors, 54:11 (2020), 1445–1449
Linking options:
https://www.mathnet.ru/eng/phts5123 https://www.mathnet.ru/eng/phts/v54/i11/p1219
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Abstract page: | 50 | Full-text PDF : | 22 |
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