Abstract:
The influence of the electrical modes of the controlled microwave magnetron pulsed inverter power supply on the conditions of large-volume microwave discharge plasma (about 9000 cm3) generation in a large-sized chamber of a resonatortype microwave plasmatron has been studied. The influence of anode current parameters in the power supply circuit of the microwave magnetron on the microwave discharge optical characteristics has been researched. A comparative analysis of the optical characteristics of the microwave discharge formed in the pulsed and constant generation modes depending on the power output of the microwave magnetron power supply has been carried out. It has been established that a decrease in the duty factor between pulses of anode current and the subsequent transition to a constant mode leads to a disproportionate increase in the energy input into the microwave discharge plasma.
Citation:
O. I. Tikhon, S. I. Madveika, S. I. Bordusau, “The study of the microwave magnetron pulse power supply electrical parameters influence on the microwave discharge plasma generation modes”, PFMT, 2022, no. 3(52), 42–47
\Bibitem{TikMadBor22}
\by O.~I.~Tikhon, S.~I.~Madveika, S.~I.~Bordusau
\paper The study of the microwave magnetron pulse power supply electrical parameters influence on the microwave discharge plasma generation modes
\jour PFMT
\yr 2022
\issue 3(52)
\pages 42--47
\mathnet{http://mi.mathnet.ru/pfmt856}
\crossref{https://doi.org/10.54341/20778708_2022_3_52_42}
\edn{https://elibrary.ru/EKYZCG}
Linking options:
https://www.mathnet.ru/eng/pfmt856
https://www.mathnet.ru/eng/pfmt/y2022/i3/p42
This publication is cited in the following 2 articles:
A. P. Dostanko, S. I. Madveyko, E. V. Telesh, S. N. Melnikov, S. M. Zavadski, D. A. Golosov, “Plasma Systems in Thin Film Technology”, Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, 22:2 (2024), 20
O. I. Tsikhan, S. I. Madveika, “Influence of the Electrical Characteristics of Pulsed Microwave Magnetron Power Supply on the Conditions for Plasma Formation in the Vacuum Chamber of Resonator-Type Plasmatron”, Nauka teh., 22:6 (2023), 487