Kinetic characteristics of dispersion of organosilicon compounds in vacuum and molecular structure of the coatings, deposited from volatile products of dispersion

It is shown that the kinetic characteristics of electron-beam dispersion of organosilicone compounds and molecular structure of the layers, deposited from the gas phase, which was formed under dispersion, are conditioned by the processes of chemical interaction, occurring in the area of electron stream towards the target. Under dispersion in plasma activation of gas phase environment the layers with lower density of hydrocarbon fragments and higher density of unsaturated bonds are formed. The possibility of the formation of highly dispersed composite coatings based on organosilicone compounds is found. The molecular structure of the organosilicone compounds has notable differences from the structure of the original components.