|
This article is cited in 3 scientific papers (total in 3 papers)
CHEMISTRY AND MATERIAL SCIENCE
Annealing atmosphere influence on contact resistivity of ohmic Pd/Ge/Au contact to n-GaAs
D. M. Mitina, F. Yu. Soldatenkova, A. M. Mozharovb, A. A. Vasil’evb, V. V. Neplokhb, I. S. Mukhinbc a Ioffe Physical Technical Institute of the Russian Academy of Sciences,
Politekhnicheskaya, 26, St. Petersburg, 194021, Russia
b Saint Petersburg National Research Academic University of the Russian Academy of Sciences,
Khlopina, 8, building 3, lit. A, St. Petersburg, 194021, Russia
c Saint Petersburg National Research University of Information Technologies, Mechanics and Optics,
Kronverkskiy, 49, St. Petersburg, 197101, Russia
Abstract:
We report the results of research for the Pd/Ge/Au ohmic contact resistivity to n-GaAs thermally treated in various gas atmospheres at
low temperature. The lowest contact resistivity of about $4\cdot 10^{-6}$ $\Omega\cdot$cm$^2$ was obtained with annealing under a hydrogen atmosphere. The
mechanism of the ohmic contact formation upon annealing under a hydrogen atmosphere has been proposed. The achieved results can be used
for development of multi-junction solar cells, power semiconductor devices, lasers, and nanowire-based structures sensible to a high temperature
treatment.
Keywords:
GaAs, ohmic contact, contact resistivity, thermal annealing, solid-phase regrowth.
Received: 08.11.2018
Citation:
D. M. Mitin, F. Yu. Soldatenkov, A. M. Mozharov, A. A. Vasil'ev, V. V. Neplokh, I. S. Mukhin, “Annealing atmosphere influence on contact resistivity of ohmic Pd/Ge/Au contact to n-GaAs”, Nanosystems: Physics, Chemistry, Mathematics, 9:6 (2018), 789–792
Linking options:
https://www.mathnet.ru/eng/nano371 https://www.mathnet.ru/eng/nano/v9/i6/p789
|
Statistics & downloads: |
Abstract page: | 98 | Full-text PDF : | 42 |
|