Temperature influence study on copper selenide films

Copper selenide was prepared by film is successfully deposited on a Fluorine-doped Tin Oxide (FTO) substrate by a brush plating technique. The film was uniform, had good adherence to the substrate and was annealed at 300$^\circ$ C and 500$^\circ$C. As the annealing temperature increased, the orientation of the crystallites is more randomized than in the as-prepared film. The structural and optical properties of the film were investigated by XRD, SEM, EDAX, UV-Visible and PL. The XRD pattern indicated that this film was crystalline in the structure.