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Matematicheskoe modelirovanie, 2012, Volume 24, Number 5, Pages 35–44 (Mi mm3247)  
Modeling of thin films surface growth

V. A. Vasil'ev, P. S. Chernov

Penza State University
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Abstract: The paper is devoted to the modeling of thin films surface growth. A short review of existing approaches and models is given. An original model of thin films surface growth is proposed representing stochastic cellular automata and allowing investigation of influence of wafer temperature, deposition rate and time on the morphology parameters of a surface. Comparison simulation results with atomic-force microscopy of experimentally received thin films samples are given.
Keywords: surface growth, thin films, stochastic cellular automata, morphology parameters.
Received: 26.04.2011
English version:
Mathematical Models and Computer Simulations, 2012, Volume 4, Issue 6, Pages 622–628
DOI: https://doi.org/10.1134/S2070048212060117
Bibliographic databases:
Document Type: Article
UDC: 519.245, 538.911, 538.975
Language: Russian
Citation: V. A. Vasil'ev, P. S. Chernov, “Modeling of thin films surface growth”, Matem. Mod., 24:5 (2012), 35–44; Math. Models Comput. Simul., 4:6 (2012), 622–628
Citation in format AMSBIB
\Bibitem{VasChe12}
\by V.~A.~Vasil'ev, P.~S.~Chernov
\paper Modeling of thin films surface growth
\jour Matem. Mod.
\yr 2012
\vol 24
\issue 5
\pages 35--44
\mathnet{http://mi.mathnet.ru/mm3247}
\elib{https://elibrary.ru/item.asp?id=21276755}
\transl
\jour Math. Models Comput. Simul.
\yr 2012
\vol 4
\issue 6
\pages 622--628
\crossref{https://doi.org/10.1134/S2070048212060117}
\scopus{https://www.scopus.com/record/display.url?origin=inward&eid=2-s2.0-84929089527}
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    		Математическое моделирование
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    References:50
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