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Mathematical models of phenomena and processes
The procedure of reserved image formation under the impulse laser exhibit of positive VUV resitor of the base of polymethylmethacrylate sensitized by anthracene, and its kinetics
A. L. Bogdanov, K. A. Valiev, L. V. Velikov, D. Yu. Zaroslov, V. A. Nikitaev, A. A. Polyakov, V. E. Tukish
Received: 27.07.1989
Citation:
A. L. Bogdanov, K. A. Valiev, L. V. Velikov, D. Yu. Zaroslov, V. A. Nikitaev, A. A. Polyakov, V. E. Tukish, “The procedure of reserved image formation under the impulse laser exhibit of positive VUV resitor of the base of polymethylmethacrylate sensitized by anthracene, and its kinetics”, Matem. Mod., 1:12 (1989), 44–51
Linking options:
https://www.mathnet.ru/eng/mm2662 https://www.mathnet.ru/eng/mm/v1/i12/p44
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Abstract page: | 293 | Full-text PDF : | 110 | References: | 1 | First page: | 1 |
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