Simple representations of electric microfield distribution in plasmas

Ionic microfield in plasmas depends strongly on electronic subsystem of plasmas. Three models for electrons influence are examined in this article: 1) uniform neutralizing background of electrons, 2) so-called low-frequency component of microfield, 3) only ionic component of microfield. Simple analytic approximations for microfield distribution in these three models are constructed. These approximations fit for plasmas with complex composition in wide range of densities and temperatures.