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Zhurnal Tekhnicheskoi Fiziki, 2016, Volume 86, Issue 1, Pages 61–69 (Mi jtf6656)  
This article is cited in 1 scientific paper (total in 1 paper)

Plasma

Magnetron source of accelerated plasma flow

L. P. Veresov, O. L. Veresov

Sukhumi Institute of Physics and Technology
Full-text PDF (1484 kB) Citations (1)
Abstract: A new source of an accelerated plasma flow intended for depositing high-quality coatings is described. In this source, a magnetron discharge for cathode target sputtering is combined with a high-voltage discharge with longitudinal oscillation of electrons for ionization of the accrued vapor in which the plasma density is distributed uniformly owing to the application of three-phase ionizer.
Keywords: Cathode Region, Plasma Accelerator, Vapor Fraction, Magnetron Discharge, Cathode Block.
Received: 16.02.2015
Revised: 15.06.2015
English version:
Technical Physics, 2016, Volume 61, Issue 1, Pages 59–67
DOI: https://doi.org/10.1134/S1063784216010254
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: L. P. Veresov, O. L. Veresov, “Magnetron source of accelerated plasma flow”, Zhurnal Tekhnicheskoi Fiziki, 86:1 (2016), 61–69; Tech. Phys., 61:1 (2016), 59–67
Citation in format AMSBIB
\Bibitem{VerVer16}
\by L.~P.~Veresov, O.~L.~Veresov
\paper Magnetron source of accelerated plasma flow
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2016
\vol 86
\issue 1
\pages 61--69
\mathnet{http://mi.mathnet.ru/jtf6656}
\elib{https://elibrary.ru/item.asp?id=25669129}
\transl
\jour Tech. Phys.
\yr 2016
\vol 61
\issue 1
\pages 59--67
\crossref{https://doi.org/10.1134/S1063784216010254}
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    • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
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