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Zhurnal Tekhnicheskoi Fiziki, 2017, Volume 87, Issue 5, Pages 776–779
DOI: https://doi.org/10.21883/JTF.2017.05.44455.2030
(Mi jtf6244)
 

This article is cited in 1 scientific paper (total in 1 paper)

Physical electronics

Effect of bias voltage and nitrogen pressure on the structure and properties of vacuum-arc (Ìî+Ti6%Si)N coatings

V. M. Beresnev, O. V. Sobol', S. V. Litovchenko, A. D. Pogrebnyak, P. A. Srebnyuk, V. Novikov, D. A. Kolesnikov, A. A. Meilekhov, A. A. Postel'nik, U. S. Nemchenko

V. N. Karazin Kharkiv National University
Full-text PDF (266 kB) Citations (1)
Abstract: Effect of deposition conditions in reactive nitrogen atmosphere on the growth morphology, phase composition, structure, and mechanical characteristics (microhardness) of vacuum-arc multilayer coatings obtained using evaporation of the (Ti6%Si) and Mo cathodes is studied with the aid of raster electron microscopy, energy-dispersive elemental microanalysis, and microindentation. It is demonstrated that nitrogen atoms are redistributed to the region of the strongest nitride-forming element (Ti) in relatively thin layers (about 7 nm) consisting of substances with substantially different heats of formation (–336 kJ/mol for TiN and –34 kJ/mol for MoN). Such a process leads to lamination with the formation of nitride TiN and metal Mo (weaker nitride-forming element). Nitrogen–metal bonds are saturated in the layers of strong nitrideforming elements Ti(Si) when the nitrogen pressure increases from 6 $\times$ 10$^{-4}$ to 5 $\times$ 10$^{-3}$ Torr in the condensation procedure. Thus, the compound is filled with nitrogen to the stoichiometric composition and, then, the second system of layers based on molybdenum is saturated with nitrogen with the formation of the $\gamma$-Mo$_2$N phase. An increase in bias potential $U_{\operatorname{SP}}$ from–100 to–200 V stimulates mixing in thin layers with the formation of the (Ti, Si, Mo)N solid solution and leads to a decrease in microhardness from 37 to 32 GPa.
Received: 06.09.2016
English version:
Technical Physics, 2017, Volume 62, Issue 5, Pages 795–798
DOI: https://doi.org/10.1134/S1063784217050073
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. M. Beresnev, O. V. Sobol', S. V. Litovchenko, A. D. Pogrebnyak, P. A. Srebnyuk, V. Novikov, D. A. Kolesnikov, A. A. Meilekhov, A. A. Postel'nik, U. S. Nemchenko, “Effect of bias voltage and nitrogen pressure on the structure and properties of vacuum-arc (Ìî+Ti6%Si)N coatings”, Zhurnal Tekhnicheskoi Fiziki, 87:5 (2017), 776–779; Tech. Phys., 62:5 (2017), 795–798
Citation in format AMSBIB
\Bibitem{BerSobLit17}
\by V.~M.~Beresnev, O.~V.~Sobol', S.~V.~Litovchenko, A.~D.~Pogrebnyak, P.~A.~Srebnyuk, V.~Novikov, D.~A.~Kolesnikov, A.~A.~Meilekhov, A.~A.~Postel'nik, U.~S.~Nemchenko
\paper Effect of bias voltage and nitrogen pressure on the structure and properties of vacuum-arc (Ìî+Ti6\%Si)N coatings
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2017
\vol 87
\issue 5
\pages 776--779
\mathnet{http://mi.mathnet.ru/jtf6244}
\crossref{https://doi.org/10.21883/JTF.2017.05.44455.2030}
\elib{https://elibrary.ru/item.asp?id=29365794}
\transl
\jour Tech. Phys.
\yr 2017
\vol 62
\issue 5
\pages 795--798
\crossref{https://doi.org/10.1134/S1063784217050073}
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  • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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