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This article is cited in 4 scientific papers (total in 4 papers)
Gases and Fluids
Simulations of dynamic resistive evaporation in a vacuum
N. L. Kazanskiia, V. A. Kolpakovb, S. V. Krichevskiyb, V. V. Podlipnovb a Image Processing Systems Institute of the RAS - Branch of the FSRC "Crystallography and Photonics" RAS, Samara, Russia, Samara
b Samara National Research University
Abstract:
The model of dynamic resistive evaporation in vacuum has been considered, and the model takes into account the structural peculiarities of the corresponding evaporator. In the model, the dependences to determine the time of material heating up to evaporation temperature as well as dynamic characteristics of the evaporation have been obtained. It has been shown that the obtained characteristics are nonharmonic and periodically repeated. The adequacy of the developed model to the physical model has been corroborated. It has been found that the discrepancy between the experimental and calculated time characteristics of shutter movement is not higher than 5%. The recommendations for using the suggested model to fabricate of thin films of multicomponent materials via thermal evaporation have been considered.
Received: 12.04.2016 Revised: 20.03.2017
Citation:
N. L. Kazanskii, V. A. Kolpakov, S. V. Krichevskiy, V. V. Podlipnov, “Simulations of dynamic resistive evaporation in a vacuum”, Zhurnal Tekhnicheskoi Fiziki, 87:10 (2017), 1483–1488; Tech. Phys., 62:10 (2017), 1490–1495
Linking options:
https://www.mathnet.ru/eng/jtf6097 https://www.mathnet.ru/eng/jtf/v87/i10/p1483
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