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This article is cited in 5 scientific papers (total in 5 papers)
Physical electronics
Properties of amorphous carbon thin films grown by ion beam sputtering
Yu. E. Kalinin, M. A. Kashirin, V. A. Makagonov, S. Yu. Pankov, A. V. Sitnikov Voronezh State Technical University
Abstract:
The electrical performance of amorphous carbon thin films obtained by the ion beam sputtering of a carbon target in argon has been investigated. It has been shown by the Raman spectroscopy method that these films have a graphite-like structure. It has also been found by conductivity and thermopower studies that the hopping mechanism of conductivity with a variable length of hops over localized states near the Fermi level changes to the mechanism of hopping over the nearest neighbors as the temperature rises from 77 to 190 K. Near room temperature, electrotransport is provided by variable-length hops over localized states at the tail of the valence band.
Received: 14.03.2017
Citation:
Yu. E. Kalinin, M. A. Kashirin, V. A. Makagonov, S. Yu. Pankov, A. V. Sitnikov, “Properties of amorphous carbon thin films grown by ion beam sputtering”, Zhurnal Tekhnicheskoi Fiziki, 87:11 (2017), 1722–1728; Tech. Phys., 62:11 (2017), 1724–1730
Linking options:
https://www.mathnet.ru/eng/jtf6085 https://www.mathnet.ru/eng/jtf/v87/i11/p1722
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Abstract page: | 49 | Full-text PDF : | 33 |
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