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Zhurnal Tekhnicheskoi Fiziki, 2018, Volume 88, Issue 2, Pages 243–250
DOI: https://doi.org/10.21883/JTF.2018.02.45416.2385 (Mi jtf5997) 		 
This article is cited in 6 scientific papers (total in 6 papers)

Physics of nanostructures

Analytical model of atomic layer deposition of films on 3D structures with high aspect ratios

A. V. Fadeev, A. V. Myakon'kikh, K. V. Rudenko

Insitute of Physics and Technology, Institution of Russian Academy of Sciences, Moscow
Full-text PDF (160 kB) Citations (6)
DOI: https://doi.org/10.21883/JTF.2018.02.45416.2385
Abstract: A theoretical model has been suggested that makes it possible to predict the profile of a film deposited on the walls of a high aspect ratio structure (trench) by atomic layer deposition versus the deposition parameters. In addition, the model allows one to calculate the optimal time of precursor doping that provides the conformal coating of the trench walls. The deposition of films with different thicknesses has been described by an approximant that includes two asymptotical deposition conditions with different relationships between the precursor molecule sticking coefficient and aspect ratio of the trench.
Received: 13.06.2017
English version:
Technical Physics, 2018, Volume 63, Issue 2, Pages 235–242
DOI: https://doi.org/10.1134/S1063784218020123
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. V. Fadeev, A. V. Myakon'kikh, K. V. Rudenko, “Analytical model of atomic layer deposition of films on 3D structures with high aspect ratios”, Zhurnal Tekhnicheskoi Fiziki, 88:2 (2018), 243–250; Tech. Phys., 63:2 (2018), 235–242
Citation in format AMSBIB
\Bibitem{FadMyaRud18}
\by A.~V.~Fadeev, A.~V.~Myakon'kikh, K.~V.~Rudenko
\paper Analytical model of atomic layer deposition of films on 3D structures with high aspect ratios
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2018
\vol 88
\issue 2
\pages 243--250
\mathnet{http://mi.mathnet.ru/jtf5997}
\crossref{https://doi.org/10.21883/JTF.2018.02.45416.2385}
\elib{https://elibrary.ru/item.asp?id=32739984}
\transl
\jour Tech. Phys.
\yr 2018
\vol 63
\issue 2
\pages 235--242
\crossref{https://doi.org/10.1134/S1063784218020123}
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    • This publication is cited in the following 6 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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