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This article is cited in 2 scientific papers (total in 2 papers)
Physical electronics
Cobalt modification of thin rutile films magnetron-sputtered in vacuum
N. N. Afonina, V. A. Logachevab a Voronezh State Pedagogical University
b Voronezh State University
Abstract:
Using X-ray phase analysis, atomic force microscopy, and secondary ion mass-spectrometry, the phase formation and component distribution in a Co–TiO$_2$ film system have been investigated during magnetron sputtering of the metal on the oxide and subsequent vacuum annealing. It has been found that cobalt diffuses deep into titanium oxide to form complex oxides CoTi$_2$O$_5$ and CoTiO$_3$. A mechanism behind their formation at grain boundaries throughout the thickness of the TiO$_2$ film is suggested. It assumes the reactive diffusion of cobalt along grain boundaries in the oxide. A quantitative model of reactive interdiffusion in a bilayer polycrystalline metal–oxide film system with limited solubility of components has been developed. The individual diffusion coefficients of cobalt and titanium have been determined in the temperature interval 923–1073 K.
Received: 13.07.2017
Citation:
N. N. Afonin, V. A. Logacheva, “Cobalt modification of thin rutile films magnetron-sputtered in vacuum”, Zhurnal Tekhnicheskoi Fiziki, 88:4 (2018), 621–627; Tech. Phys., 63:4 (2018), 605–611
Linking options:
https://www.mathnet.ru/eng/jtf5951 https://www.mathnet.ru/eng/jtf/v88/i4/p621
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