Zhurnal Tekhnicheskoi Fiziki
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive
Guidelines for authors

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS



Zhurnal Tekhnicheskoi Fiziki:
Year:
Volume:
Issue:
Page:
Find






Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register


Zhurnal Tekhnicheskoi Fiziki, 2018, Volume 88, Issue 6, Pages 914–919
DOI: https://doi.org/10.21883/JTF.2018.06.46025.2544
(Mi jtf5902)
 

This article is cited in 13 scientific papers (total in 13 papers)

Electrophysics, electron and ion beams, physics of accelerators

High-efficiency electron source with a hollow cathode in technologies of thin film deposition and surface treatment under forevacuum pressures

V. G. Shchukin, V. O. Konstantinov, V. S. Morozov

S.S. Kutateladze Institute of Thermophysics, Siberian Division of the Russian Academy of Sciences
Abstract: It is shown that low-energy beams with a high efficiency in a wide range of beam currents can be obtained in electron sources with a hollow cathode in the forevacuum pressure range. By varying the geometrical parameters of the electrode system and electromagnetic optics of the electron source, we succeeded in reaching the efficiency at a level of 0.9 for an accelerating potential of 1 kV and beam currents from 100 to 300 mA. The parameters affecting most strongly the efficiency and stability of operation of the electron source with a hollow cathode have been determined.
Funding agency Grant number
Russian Foundation for Basic Research 17-48-540665 р_а
Received: 03.11.2017
English version:
Technical Physics, 2018, Volume 63, Issue 6, Pages 888–893
DOI: https://doi.org/10.1134/S1063784218060191
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. G. Shchukin, V. O. Konstantinov, V. S. Morozov, “High-efficiency electron source with a hollow cathode in technologies of thin film deposition and surface treatment under forevacuum pressures”, Zhurnal Tekhnicheskoi Fiziki, 88:6 (2018), 914–919; Tech. Phys., 63:6 (2018), 888–893
Citation in format AMSBIB
\Bibitem{ShcKonMor18}
\by V.~G.~Shchukin, V.~O.~Konstantinov, V.~S.~Morozov
\paper High-efficiency electron source with a hollow cathode in technologies of thin film deposition and surface treatment under forevacuum pressures
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2018
\vol 88
\issue 6
\pages 914--919
\mathnet{http://mi.mathnet.ru/jtf5902}
\crossref{https://doi.org/10.21883/JTF.2018.06.46025.2544}
\elib{https://elibrary.ru/item.asp?id=34982864}
\transl
\jour Tech. Phys.
\yr 2018
\vol 63
\issue 6
\pages 888--893
\crossref{https://doi.org/10.1134/S1063784218060191}
Linking options:
  • https://www.mathnet.ru/eng/jtf5902
  • https://www.mathnet.ru/eng/jtf/v88/i6/p914
  • This publication is cited in the following 13 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Zhurnal Tekhnicheskoi Fiziki Zhurnal Tekhnicheskoi Fiziki
    Statistics & downloads:
    Abstract page:37
    Full-text PDF :20
     
      Contact us:
     Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2024