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Zhurnal Tekhnicheskoi Fiziki, 2020, Volume 90, Issue 1, Pages 155–160
DOI: https://doi.org/10.21883/JTF.2020.01.48678.89-19
(Mi jtf5423)
 

This article is cited in 3 scientific papers (total in 3 papers)

Physical electronics

Ranges of hydrogen, deuterium, and helium atoms in amorphous silicon and tungsten

D. S. Meluzova, P. Yu. Babenko, A. P. Shergin, A. N. Zinov'ev

Ioffe Institute, St. Petersburg
Full-text PDF (235 kB) Citations (3)
Abstract: We have obtained the range distributions for H, D, and He atoms within an energy range of 0.1–100 keV in amorphous W and Si for the normal incidence of bombarding particles. Calculations have been performed both in the binary collision approximation and by a more accurate method of calculating particle trajectories. It is shown that the results of both methods are in good agreement with each other and with experimental data on the mean ranges for the H–Si system. The influence of the attracting well in the particle–solid interaction potential on the results of calculations is estimated.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation
This study was performed under a State assignment of the Ministry of Education and Science of the Russian Federation for the Federal State Budget Scientific Enterprise Ioffe Institute, Russian Academy of Sciences.
Received: 09.03.2019
Revised: 07.06.2019
Accepted: 29.06.2019
English version:
Technical Physics, 2020, Volume 65, Issue 1, Pages 145–150
DOI: https://doi.org/10.1134/S106378422001017X
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: D. S. Meluzova, P. Yu. Babenko, A. P. Shergin, A. N. Zinov'ev, “Ranges of hydrogen, deuterium, and helium atoms in amorphous silicon and tungsten”, Zhurnal Tekhnicheskoi Fiziki, 90:1 (2020), 155–160; Tech. Phys., 65:1 (2020), 145–150
Citation in format AMSBIB
\Bibitem{MelBabShe20}
\by D.~S.~Meluzova, P.~Yu.~Babenko, A.~P.~Shergin, A.~N.~Zinov'ev
\paper Ranges of hydrogen, deuterium, and helium atoms in amorphous silicon and tungsten
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2020
\vol 90
\issue 1
\pages 155--160
\mathnet{http://mi.mathnet.ru/jtf5423}
\crossref{https://doi.org/10.21883/JTF.2020.01.48678.89-19}
\elib{https://elibrary.ru/item.asp?id=42744570}
\transl
\jour Tech. Phys.
\yr 2020
\vol 65
\issue 1
\pages 145--150
\crossref{https://doi.org/10.1134/S106378422001017X}
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  • This publication is cited in the following 3 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Zhurnal Tekhnicheskoi Fiziki Zhurnal Tekhnicheskoi Fiziki
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