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This article is cited in 6 scientific papers (total in 6 papers)
Physical electronics
Structural properties of carbon films fabricated by ion-assisted pulsed-plasma deposition
I. A. Zavidovskiy, O. A. Streletskii, O. Yu. Nischak, N. F. Savchenko, S. V. Dvoryak, A. V. Pavlikov Lomonosov Moscow State University
Abstract:
Carbon films fabricated by pulsed-plasma ion-assisted sputtering of graphite in argon and nitrogen atmosphere are studied using Raman spectroscopy, electron diffraction, and X-ray photoelectron spectroscopy. The results show that nitrogen is efficiently incorporated in the material structure, which leads to formation of oriented graphite nanoclusters the amount of which increases with an increase in the assistance energy.
Keywords:
amorphous carbon, thin films, ion assistance, Raman spectroscopy, X-ray photoelectron spectroscopy.
Received: 05.06.2019 Revised: 21.09.2019 Accepted: 25.09.2019
Citation:
I. A. Zavidovskiy, O. A. Streletskii, O. Yu. Nischak, N. F. Savchenko, S. V. Dvoryak, A. V. Pavlikov, “Structural properties of carbon films fabricated by ion-assisted pulsed-plasma deposition”, Zhurnal Tekhnicheskoi Fiziki, 90:3 (2020), 489–493; Tech. Phys., 65:3 (2020), 468–472
Linking options:
https://www.mathnet.ru/eng/jtf5369 https://www.mathnet.ru/eng/jtf/v90/i3/p489
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