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Zhurnal Tekhnicheskoi Fiziki, 2020, Volume 90, Issue 11, Pages 1870–1875
DOI: https://doi.org/10.21883/JTF.2020.11.49977.135-20 (Mi jtf5155) 		 
This article is cited in 7 scientific papers (total in 7 papers)

XXIV International Symposium Nanophysics and Nanoelectronics, Nizhny Novgorod, March 10--13, 2020
Physics of nanostructures

The smoothing effect of si layers in multilayer Be/Al mirrors for the 17- to 31-nm range

R. S. Pleshkova, S. Yu. Zueva, V. N. Polkovnikova, N. N. Salashchenkoa, M. V. Svechnikova, N. I. Chkhaloa, P. Jonnardb

a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b Laboratoire de Chimie Physique – MatièreetRayonnement, UPMC Univ Paris 06/CNRS UMR 761411 Paris, France
Full-text PDF (470 kB) Citations (7)
DOI: https://doi.org/10.21883/JTF.2020.11.49977.135-20
Abstract: The smoothing effect of thin silicon films used as buffer layers in multilayer Be/Al mirrors optimized for wavelengths longer than 17.1 nm has been investigated. The objects of investigation have been near-normal incidence (an angle of incidence of 88$^\circ$) and grazing incidence (33.5$^\circ$) mirrors. This effect has been observed in multilayer Be/Si/Al mirrors with periods of up to at least 29 nm. For normal incidence mirrors optimized for a wavelength of 17.14 nm, a record-high value of the peak reflection coefficient, 62.5%, has been achieved at spectral selectivity $\lambda/\Delta\lambda$ = 59. The temporal stability of the mirrors has been studied.
Keywords: X-ray radiation, multilayer mirrors, magnetron sputtering, smoothing barrier layer.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation 0035-2014-0204
Russian Foundation for Basic Research 18-02-00588
19-32-90154
This study was supported by state order no. 0035-2014-0204 and the Russian Foundation for Basic Research, grants nos. 18-02-00588 and 19-32-90154.
Received: 16.04.2020
Revised: 16.04.2020
Accepted: 16.04.2020
English version:
Technical Physics, 2020, Volume 65, Issue 11, Pages 1786–1791
DOI: https://doi.org/10.1134/S1063784220110201
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: R. S. Pleshkov, S. Yu. Zuev, V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, N. I. Chkhalo, P. Jonnard, “The smoothing effect of si layers in multilayer Be/Al mirrors for the 17- to 31-nm range”, Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1870–1875; Tech. Phys., 65:11 (2020), 1786–1791
Citation in format AMSBIB
\Bibitem{PleZuePol20}
\by R.~S.~Pleshkov, S.~Yu.~Zuev, V.~N.~Polkovnikov, N.~N.~Salashchenko, M.~V.~Svechnikov, N.~I.~Chkhalo, P.~Jonnard
\paper The smoothing effect of si layers in multilayer Be/Al mirrors for the 17- to 31-nm range
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2020
\vol 90
\issue 11
\pages 1870--1875
\mathnet{http://mi.mathnet.ru/jtf5155}
\crossref{https://doi.org/10.21883/JTF.2020.11.49977.135-20}
\elib{https://elibrary.ru/item.asp?id=44588716}
\transl
\jour Tech. Phys.
\yr 2020
\vol 65
\issue 11
\pages 1786--1791
\crossref{https://doi.org/10.1134/S1063784220110201}
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    • This publication is cited in the following 7 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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