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Zhurnal Tekhnicheskoi Fiziki, 2021, Volume 91, Issue 8, Pages 1286–1292
DOI: https://doi.org/10.21883/JTF.2021.08.51106.15-21
(Mi jtf4963)
 

This article is cited in 2 scientific papers (total in 2 papers)

Physical electronics

Dependence of mechanical and tribological properties of $\alpha$-C : H : SiO$_{x}$ films on the bias voltage amplitude of the substrate

A. S. Grenadyorova, A. A. Solov'eva, K. V. Oskomova, M. O. Zhulkovab

a Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, Tomsk
b National Medical Research Center Named after Academician Meshalkin, Novosibirsk
Abstract: The paper presents the AISI 316L stainless steel surface modification by plasma-assisted chemical vapor deposition of $\alpha$-C : H : SiO$_{x}$ film using the pulsed bipolar substrate bias voltage. The mechanical and tribological properties of the $\alpha$-C : H : SiO$_{x}$ film and the steel surface are examined using the nanoindentation method and the pin-on-disk tribometer, respectively. The optimum value is obtained for the amplitude of the negative pulse of the bipolar bias voltage, when the hardness of the a-C:H:SiOx film is high (19 $\pm$ 2 GPa). This hardness value is 3.5 times greater, than the hardness of the AISI 316L steel surface (5.5 $\pm$ 0.1 GPa). At the same time, the coefficient of friction of the film is low (0.08), which is 9 times lower than that of the steel (0.72). The wear rate values are found to be 8.5 $\times$ 10$^{-7}$ and 3.7 $\times$ 10$^{-5}$ mm$^3$ N$^{-1}$m$^{-1}$ for the coated and uncoated steel, respectively. The structure and composition of the obtained films are studied by Raman spectroscopy and scanning electron microscopy.
Keywords: medical steel, $\alpha$-C : H : SiO$_{x}$ films, hardness, low friction coefficient, wear resistance.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation FWRM-2021-0006
MK-1234.2020.8
This study was supported under state order no. FWRM-2021-0006 by a grant from the President of the Russian Federation, project no. MK-1234.2020.8.
Received: 26.01.2021
Revised: 26.02.2021
Accepted: 19.03.2021
English version:
Technical Physics, 2021, Volume 66, Issue 10, Pages 1111–1117
DOI: https://doi.org/10.1134/S1063784221080089
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. S. Grenadyorov, A. A. Solov'ev, K. V. Oskomov, M. O. Zhulkov, “Dependence of mechanical and tribological properties of $\alpha$-C : H : SiO$_{x}$ films on the bias voltage amplitude of the substrate”, Zhurnal Tekhnicheskoi Fiziki, 91:8 (2021), 1286–1292; Tech. Phys., 66:10 (2021), 1111–1117
Citation in format AMSBIB
\Bibitem{GreSolOsk21}
\by A.~S.~Grenadyorov, A.~A.~Solov'ev, K.~V.~Oskomov, M.~O.~Zhulkov
\paper Dependence of mechanical and tribological properties of $\alpha$-C : H : SiO$_{x}$ films on the bias voltage amplitude of the substrate
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2021
\vol 91
\issue 8
\pages 1286--1292
\mathnet{http://mi.mathnet.ru/jtf4963}
\crossref{https://doi.org/10.21883/JTF.2021.08.51106.15-21}
\elib{https://elibrary.ru/item.asp?id=46470580}
\transl
\jour Tech. Phys.
\yr 2021
\vol 66
\issue 10
\pages 1111--1117
\crossref{https://doi.org/10.1134/S1063784221080089}
\scopus{https://www.scopus.com/record/display.url?origin=inward&eid=2-s2.0-85124770590}
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  • This publication is cited in the following 2 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    Zhurnal Tekhnicheskoi Fiziki Zhurnal Tekhnicheskoi Fiziki
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