Abstract:
It is shown that the treatment of stoichiometric HfO2, which is synthesized by atomic layer deposition, in electron cyclotron resonance hydrogen plasma leads to a significant depletion of the film in oxygen and the formation of nonstoichiometric HfOx (x<2). The longer the treatment time, the higher the degree of oxygen depletion. The charge transfer in the films under study occurs by phonon-assisted tunneling between oxygen vacancies serving as traps. It has been found that the p++-Si/HfOx/Ni structures, where the oxide layer is treated in the electron cyclotron resonance hydrogen plasma, have memristor properties: they are reversibly switched between high and low resistance states. The fabricated memristor structures are forming-free.
This work was supported by the Russian Science Foundation (project no. 19-19-00286) (synthesis of samples and XPS analysis) and by the Ministry of Science and Higher Education of the Russian Federation (state contract no. 0242-2021-0003 with the Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, measurements and analysis of current--voltage characteristics).
Citation:
T. V. Perevalov, R. M. Kh. Iskhakzai, I. P. Prosvirin, V. Sh. Aliev, V. A. Gritsenko, “Forming-free memristors based on hafnium oxide processed in electron cyclotron resonance hydrogen plasma”, Pis'ma v Zh. Èksper. Teoret. Fiz., 115:2 (2022), 89–93; JETP Letters, 115:2 (2022), 79–83
This publication is cited in the following 4 articles:
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V. A. Volodin, F. Zhang, I. D. Yushkov, L. Yin, G. N. Kamaev, Optoelectron.Instrument.Proc., 58:6 (2022), 584