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Pis'ma v Zhurnal Èksperimental'noi i Teoreticheskoi Fiziki, 2022, Volume 115, Issue 2, Pages 89–93
DOI: https://doi.org/10.31857/S1234567822020045
(Mi jetpl6590)
 

This article is cited in 4 scientific papers (total in 4 papers)

CONDENSED MATTER

Forming-free memristors based on hafnium oxide processed in electron cyclotron resonance hydrogen plasma

T. V. Perevalova, R. M. Kh. Iskhakzaia, I. P. Prosvirinb, V. Sh. Alievca, V. A. Gritsenkoac

a Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia
b Boreskov Institute of Catalysis, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia
c Novosibirsk State Technical University, Novosibirsk, 630073 Russia
Full-text PDF (388 kB) Citations (4)
References:
Abstract: It is shown that the treatment of stoichiometric HfO2, which is synthesized by atomic layer deposition, in electron cyclotron resonance hydrogen plasma leads to a significant depletion of the film in oxygen and the formation of nonstoichiometric HfOx (x<2). The longer the treatment time, the higher the degree of oxygen depletion. The charge transfer in the films under study occurs by phonon-assisted tunneling between oxygen vacancies serving as traps. It has been found that the p++-Si/HfOx/Ni structures, where the oxide layer is treated in the electron cyclotron resonance hydrogen plasma, have memristor properties: they are reversibly switched between high and low resistance states. The fabricated memristor structures are forming-free.
Funding agency Grant number
Russian Science Foundation 19-19-00286
Ministry of Science and Higher Education of the Russian Federation 0242-2021-0003
This work was supported by the Russian Science Foundation (project no. 19-19-00286) (synthesis of samples and XPS analysis) and by the Ministry of Science and Higher Education of the Russian Federation (state contract no. 0242-2021-0003 with the Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, measurements and analysis of current--voltage characteristics).
Received: 17.11.2021
Revised: 17.11.2021
Accepted: 25.11.2021
English version:
Journal of Experimental and Theoretical Physics Letters, 2022, Volume 115, Issue 2, Pages 79–83
DOI: https://doi.org/10.1134/S0021364022020084
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: T. V. Perevalov, R. M. Kh. Iskhakzai, I. P. Prosvirin, V. Sh. Aliev, V. A. Gritsenko, “Forming-free memristors based on hafnium oxide processed in electron cyclotron resonance hydrogen plasma”, Pis'ma v Zh. Èksper. Teoret. Fiz., 115:2 (2022), 89–93; JETP Letters, 115:2 (2022), 79–83
Citation in format AMSBIB
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\paper Forming-free memristors based on hafnium oxide processed in electron cyclotron resonance hydrogen plasma
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\pages 89--93
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  • This publication is cited in the following 4 articles:
    1. A. O. Shilov, S. S. Savchenko, K. Zhusupov, A. S. Vokhmintsev, I. A. Weinstein, Bull. Russ. Acad. Sci. Phys., 2025  crossref
    2. Horatio R. J. Cox, Matthew K. Sharpe, Callum McAleese, Mikko Laitinen, Jeevan Dulai, Richard Smith, Jonathan England, Wing H. Ng, Mark Buckwell, Longfei Zhao, Sarah Fearn, Adnan Mehonic, Anthony J. Kenyon, Advanced Materials, 2024  crossref
    3. Jung-Kyu Lee, Osung Kwon, Beomki Jeon, Sungjun Kim, IEEE Trans. Electron Devices, 70:11 (2023), 5651  crossref
    4. V. A. Volodin, F. Zhang, I. D. Yushkov, L. Yin, G. N. Kamaev, Optoelectron.Instrument.Proc., 58:6 (2022), 584  crossref
    Citing articles in Google Scholar: Russian citations, English citations
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    Письма в Журнал экспериментальной и теоретической физики Pis'ma v Zhurnal Иksperimental'noi i Teoreticheskoi Fiziki
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    References:39
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