Pis'ma v Zhurnal Èksperimental'noi i Teoreticheskoi Fiziki
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive
Impact factor

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS



Pis'ma v Zh. Èksper. Teoret. Fiz.:
Year:
Volume:
Issue:
Page:
Find






Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register


Pis'ma v Zhurnal Èksperimental'noi i Teoreticheskoi Fiziki, 2003, Volume 77, Issue 2, Pages 85–88 (Mi jetpl2714)  

This article is cited in 2 scientific papers (total in 2 papers)

ATOMS, SPECTRA, RADIATIONS

Smoothing of interfacial micron-scale roughness in a Ni/C X-ray multilayer mirror

N. V. Kovalenkoa, S. V. Mytnichenkob, V. A. Chernovc

a G I. Budker Institute of Nuclear Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
b Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch of the Russian Academy of Sciences
c Boreskov Institute of Catalysis SB RAS, Novosibirsk
Full-text PDF (201 kB) Citations (2)
References:
Abstract: Correlation between the roughness of neighboring interfaces (roughness cross correlation) in a Ni/C X-ray multilayer mirror (XMM) prepared by laser ablation was studied by measuring X-ray diffuse scattering (XDS). The XDS intensities in the vicinity of the first Bragg reflection were measured at different photon energies: slightly below (8.325 keV) and slightly above (8.350 keV) the nickel photoabsorption $K$ edge. The effective screening of the contribution from the deep layers to the XDS cross section due to the strong damping of the wave field at a photon energy higher than the photoabsorption edge allowed information on the character of the in-depth roughness cross correlation in the sample to be obtained. In particular, the characteristic lateral correlation length of the roughness was $0.35\mathrm{\mu m}$ at a photon energy of 8.325 keV (the contribution to the XDS cross section of the entire XMM volume), and it increased to $0.4 \mathrm{\mu m}$ at a photon energy of 8.350 keV (predominantly the contribution from the upper layers). These data give direct evidence for the mechanism of smoothing of the interfacial roughness in the process of Ni/C XMM growth on anomalously large (up to micron) spatial scales. It was found that only rough large-scale defects with sizes of $\geq 10\mathrm{\mu m}$ are reproduced reasonably well from layer to layer. The processes of viscous flow and (or) reevaporation of high-energy target ions during deposition, which is characteristic of the laser method of XMM preparation, may serve as a possible explanation of the observed phenomenon.
Received: 25.11.2002
English version:
Journal of Experimental and Theoretical Physics Letters, 2003, Volume 77, Issue 2, Pages 80–83
DOI: https://doi.org/10.1134/1.1564224
Bibliographic databases:
Document Type: Article
PACS: 61.10.Lx, 68.55.-a
Language: Russian
Citation: N. V. Kovalenko, S. V. Mytnichenko, V. A. Chernov, “Smoothing of interfacial micron-scale roughness in a Ni/C X-ray multilayer mirror”, Pis'ma v Zh. Èksper. Teoret. Fiz., 77:2 (2003), 85–88; JETP Letters, 77:2 (2003), 80–83
Citation in format AMSBIB
\Bibitem{KovMytChe03}
\by N.~V.~Kovalenko, S.~V.~Mytnichenko, V.~A.~Chernov
\paper Smoothing of interfacial micron-scale roughness in a Ni/C X-ray multilayer mirror
\jour Pis'ma v Zh. \`Eksper. Teoret. Fiz.
\yr 2003
\vol 77
\issue 2
\pages 85--88
\mathnet{http://mi.mathnet.ru/jetpl2714}
\transl
\jour JETP Letters
\yr 2003
\vol 77
\issue 2
\pages 80--83
\crossref{https://doi.org/10.1134/1.1564224}
\scopus{https://www.scopus.com/record/display.url?origin=inward&eid=2-s2.0-20644460994}
Linking options:
  • https://www.mathnet.ru/eng/jetpl2714
  • https://www.mathnet.ru/eng/jetpl/v77/i2/p85
  • This publication is cited in the following 2 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Письма в Журнал экспериментальной и теоретической физики Pis'ma v Zhurnal Иksperimental'noi i Teoreticheskoi Fiziki
     
      Contact us:
     Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2024