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Pis'ma v Zhurnal Èksperimental'noi i Teoreticheskoi Fiziki, 2011, Volume 93, Issue 10, Pages 665–668 (Mi jetpl1911)  

This article is cited in 12 scientific papers (total in 12 papers)

CONDENSED MATTER

Femtosecond pulse crystallization of thin amorphous hydrogenated films on glass substrates using near ultraviolet laser radiation

V. A. Volodina, A. S. Kackoa, A. G. Cherkova, A. V. Latyshevba, J. Kochc, B. N. Chichkovc

a A. V. Rzhanov Institute of Semiconductor Physics of SB RAS, Novosibirsk
b Novosibirsk State University
c Laser Zentrum Hannover
References:
Abstract: Femtosecond laser treatments (second harmonic of Ti-sapphire laser, $\lambda\approx400$ nm wavelength, $<30$ fs pulse duration) were applied for crystallization of thin hydrogenated amorphous silicon films on glass substrates. The concentration of atomic hydrogen in the films was varied from $10$ to $\approx35\%$. The energy densities (laser fluences) for crystallization of the films with thicknesses from $20$ to $130$ nm were found. Assumedly, non-thermal processes (plasma annealing) take place in phase transition caused ultra-fast pulses. The developed approach can be used for creation of polycrystalline silicon films on non-refractory substrates.
Received: 15.03.2011
Revised: 11.04.2011
English version:
Journal of Experimental and Theoretical Physics Letters, 2011, Volume 93, Issue 10, Pages 603–606
DOI: https://doi.org/10.1134/S0021364011100134
Bibliographic databases:
Document Type: Article
Language: English
Citation: V. A. Volodin, A. S. Kacko, A. G. Cherkov, A. V. Latyshev, J. Koch, B. N. Chichkov, “Femtosecond pulse crystallization of thin amorphous hydrogenated films on glass substrates using near ultraviolet laser radiation”, Pis'ma v Zh. Èksper. Teoret. Fiz., 93:10 (2011), 665–668; JETP Letters, 93:10 (2011), 603–606
Citation in format AMSBIB
\Bibitem{VolKacChe11}
\by V.~A.~Volodin, A.~S.~Kacko, A.~G.~Cherkov, A.~V.~Latyshev, J.~Koch, B.~N.~Chichkov
\paper Femtosecond pulse crystallization of thin amorphous hydrogenated films on glass substrates using near ultraviolet laser radiation
\jour Pis'ma v Zh. \`Eksper. Teoret. Fiz.
\yr 2011
\vol 93
\issue 10
\pages 665--668
\mathnet{http://mi.mathnet.ru/jetpl1911}
\transl
\jour JETP Letters
\yr 2011
\vol 93
\issue 10
\pages 603--606
\crossref{https://doi.org/10.1134/S0021364011100134}
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\scopus{https://www.scopus.com/record/display.url?origin=inward&eid=2-s2.0-79960802228}
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  • https://www.mathnet.ru/eng/jetpl/v93/i10/p665
  • This publication is cited in the following 12 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Письма в Журнал экспериментальной и теоретической физики Pis'ma v Zhurnal Иksperimental'noi i Teoreticheskoi Fiziki
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