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Pis'ma v Zhurnal Èksperimental'noi i Teoreticheskoi Fiziki, 2008, Volume 88, Issue 2, Pages 103–106
(Mi jetpl168)
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This article is cited in 16 scientific papers (total in 16 papers)
PLASMA, GASES
Extreme-ultraviolet source based on the electron-cyclotron-resonance discharge
A. V. Vodopyanova, S. V. Golubeva, D. A. Mansfelda, A. G. Nikolaevb, K. P. Savkinb, N. N. Salashchenkoc, N. I. Chkhaloc, G. Yu. Yushkovb a Institute of Applied Physics, Russian Academy of Sciences, Nizhny Novgorod, 603950, Russia
b Institute of High-Current Electronics, Siberian Branch, Russian Academy of Sciences, Tomsk, 634055, Russia
c Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, 603950, Russia
Abstract:
An extreme-ultraviolet (EUV) source based on a low-pressure discharge sustained in a magnetic trap by the high-power millimeter-wave radiation under electron-cyclotron-resonance (ECR) conditions is discussed. Multiply charged ions are efficiently generated and excited in such a discharge (tin ions injected into the trap from a vacuum-arc discharge were used) and emit line radiation in the desired wavelength range. A radiation power of 50 W in a wavelength range of 13.5 nm ± 1% and an efficiency of about 1% for the conversion of the micro-wave radiation absorbed in the plasma to the extreme ultraviolet radiation were achieved in the preliminary experiments.
Received: 12.05.2008 Revised: 16.06.2008
Citation:
A. V. Vodopyanov, S. V. Golubev, D. A. Mansfeld, A. G. Nikolaev, K. P. Savkin, N. N. Salashchenko, N. I. Chkhalo, G. Yu. Yushkov, “Extreme-ultraviolet source based on the electron-cyclotron-resonance discharge”, Pis'ma v Zh. Èksper. Teoret. Fiz., 88:2 (2008), 103–106; JETP Letters, 88:2 (2008), 95–98
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https://www.mathnet.ru/eng/jetpl168 https://www.mathnet.ru/eng/jetpl/v88/i2/p103
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Abstract page: | 449 | Full-text PDF : | 223 | References: | 47 |
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