On a film growth model in the process of pulsed laser deposition based on the differential equations' solution

Background. Pulsed laser deposition is one of the most promising modern methods for producing epitaxial layers. The method gives a possibility to apply materials with special properties (metals, carbides, etc.) to the surface of parts, which allows restoring geometry, increasing surface strength and corrosion resistance, etc. This study considers an analytical approach for solution of partial differential equations. This approach has been used for analysis of mass and heat transfer in reaction chamber during growth of the epitaxial layers by using pulse laser deposition. Changing of mass and heat transfer is investigated depending on a number of parameters. Materials and methods. We consider an analytical approach for analysis of considered in this work mass and heat transfer, which allows taking into account the change in the parameters of processes simultaneously in space and in time, as well as the nonlinearity of the processes. Results and conclusions. The approach for analysis mass and heat transfer, which were considered in this work, makes it possible to carry out a more adequate prognosis of growth of an epitaxial layer by using pulsed laser deposition in comparison with similar approaches.