Abstract:
The interatomic interaction and phase formation at interfaces between the metallic layers Co45Fe45Zr10 and nonmetallic interlayers of amorphous silicon or silicon dioxide in multilayered nanostructures (Co45Fe45Zr10/a-Si)40 and (Co45Fe45Zr10/Si2)32 have been investigated using ultrasoft X-ray emission spectroscopy (USXES) and X-ray diffractometry. The multilayered nanostructures have been fabricated by ion-beam sputtering of two targets onto the surface of a rotating glass-ceramic substrate. The investigations have demonstrated that, regardless of the expected composition of the interlayer (amorphous silicon or silicon dioxide), d-metal silicides, predominantly lower cobalt silicides, are formed at the metallic layer/interlayer interface. However, in this case, the thickness of silicide interfaces in the multilayered nanostructures with oxide interlayers (series O) has a significantly lower value of ∼0.1 nm, and, therefore, the central layer of the interlayers remains oxide. In the multilayered nanostructures with amorphous silicon interlayers almost all silicon is consumed in the formation of nonmagnetic silicide phases. When the thickness of this interlayer exceeds the thickness of the metallic layer, the multilayered nanostructures become nonmagnetic.
Citation:
È. P. Domashevskaya, V. A. Terekhov, S. Yu. Turishchev, D. E. Spirin, A. V. Chernyshev, Yu. E. Kalinin, A. V. Sitnikov, “Interatomic interactions at interfaces of multilayered nanostructures (Co45Fe45Zr10/a-Si)40 and (Co45Fe45Zr10/Si2)32”, Fizika Tverdogo Tela, 58:5 (2016), 991–999; Phys. Solid State, 58:5 (2016), 1024–1033
\Bibitem{DomTerTur16}
\by \`E.~P.~Domashevskaya, V.~A.~Terekhov, S.~Yu.~Turishchev, D.~E.~Spirin, A.~V.~Chernyshev, Yu.~E.~Kalinin, A.~V.~Sitnikov
\paper Interatomic interactions at interfaces of multilayered nanostructures (Co$_{45}$Fe$_{45}$Zr$_{10}$/$a$-Si)$_{40}$ and (Co$_{45}$Fe$_{45}$Zr$_{10}$/Si$_{2}$)$_{32}$
\jour Fizika Tverdogo Tela
\yr 2016
\vol 58
\issue 5
\pages 991--999
\mathnet{http://mi.mathnet.ru/ftt9991}
\elib{https://elibrary.ru/item.asp?id=27368624 }
\transl
\jour Phys. Solid State
\yr 2016
\vol 58
\issue 5
\pages 1024--1033
\crossref{https://doi.org/10.1134/S1063783416050061}
Linking options:
https://www.mathnet.ru/eng/ftt9991
https://www.mathnet.ru/eng/ftt/v58/i5/p991
This publication is cited in the following 6 articles:
G P Potudanskii, S I Kurganskii, E P Domashevskaya, “Oscillating fine structure of x-ray absorption and atomic structure of metallic layers in a magnetic multilayer nanostructure (So45Fe45Zr10/SiO2)n”, Mater. Res. Express, 6:11 (2019), 1150g9
Evelina P. Domashevskaya, Yaroslav A. Peshkov, Vladimir A. Terekhov, Yury A. Yurakov, Konstantin A. Barkov, “Phase composition of the buried silicon interlayers in the amorphous multilayer nanostructures [(Co45Fe45Zr10)/a‐Si:H]41 and [(Co45Fe45Zr10)35(Al2O3)65/a‐Si:H]41”, Surface & Interface Analysis, 50:12-13 (2018), 1265
E. P. Domashevskaya, N. S. Builov, A. N. Lukin, A. V. Sitnikov, “IR Spectroscopic Study of Interatomic Interaction in [(CoFeB)60C40/SiO2]200 and [(CoFeB)34(SiO2)66/C]46 Multilayer Nanostructures with Metal-Containing Composite Layers”, Inorg Mater, 54:2 (2018), 140
E. P. Domashevskaya, N. S. Builov, V. A. Terekhov, K. I. Barkov, V. G. Sitnikov, Yu. E. Kalinin, “Electronic structure and phase composition of silicon oxide in the metal-containing composite layers of a [(Co40Fe40B20)34(SiO2)66/C]46 multilayer amorphous nanostructure with carbon interlayers”, Inorg Mater, 53:9 (2017), 930
È. P. Domashevskaya, N. S. Builov, V. A. Terekhov, K. A. Barkov, V. G. Sitnikov, “Electronic structure and phase composition of dielectric interlayers in multilayer amorphous nanostructure [(CoFeB)60C40/SiO2]200”, Phys. Solid State, 59:1 (2017), 168–173
È. P. Domashevskaya, A. A. Guda, A. V. Chernyshev, V. G. Sitnikov, “Specific features of the atomic structure of metallic layers of multilayered (CoFeZr/SiO2)32 and (CoFeZr/a-Si)40 nanostructures with different interlayers”, Phys. Solid State, 59:2 (2017), 385–391