Abstract:
Laser annealing experiments were performed in order to increase the concentration of electrically active manganese in the layers of A3B5: Mn semiconductors. An LPX-200 KrF excimer laser with a wavelength of 248 nm and a pulse duration of ∼30 ns was used. It is shown experimentally that at a pulse energy of an excimer laser of > 230 mJ/cm2, the hole concentration in GaAs: Mn layers increases to 3 × 1020 cm−3. The negative magnetoresistance and the anomalous Hall effect with a hysteresis loop for annealed GaAs: Mn samples remain the same up to 80–100 K. Similar changes are observed for InAs: Mn layers as a result of laser annealing.
Citation:
O. V. Vikhrova, Yu. A. Danilov, B. N. Zvonkov, A. V. Zdoroveyshchev, A. V. Kudrin, V. P. Lesnikov, A. V. Nezhdanov, S. A. Pavlov, A. E. Parafin, I. Yu. Pashen'kin, S. M. Plankina, “Modification of the properties of ferromagnetic layers based on A3B5 compounds by pulsed laser annealing”, Fizika Tverdogo Tela, 59:11 (2017), 2130–2134; Phys. Solid State, 59:11 (2017), 2150–2154