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Fizika Tverdogo Tela, 2018, Volume 60, Issue 4, Pages 739–742
DOI: https://doi.org/10.21883/FTT.2018.04.45685.09D (Mi ftt9239) 		 
This article is cited in 1 scientific paper (total in 1 paper)

Ferroelectricity

Electrical conductivity and barrier properties of lithium niobate thin films

S. I. Gudkova, K. D. Baklanovaa, M. V. Kamenshchikova, A. V. Solnyshkinab, A. N. Belovb

a Tver State University
b National Research University of Electronic Technology
Full-text PDF (367 kB) Citations (1)
DOI: https://doi.org/10.21883/FTT.2018.04.45685.09D
Abstract: The thin-film structures made of LiNbO3 and obtained via laser ablation and magnetron sputtering are studied with volt-farad and volt-ampere characteristics. A potential barrier on the Si–LiNbO3 interface was found for both types of the films with the capacitance-voltage characteristics. The current-voltage characteristics showed that there are several conduction mechanisms in the structures studied. The Poole–Frenkel effect and the currents limited by a space charge mainly contribute to the electrical conductivity in the LiNbO3 film produced with the laser ablation method. The currents limited by a space charge contribute to the main mechanism in the film heterostructure obtained with the magnetron sputtering method.
Funding agency Grant number
Russian Science Foundation 15-19-00138
English version:
Physics of the Solid State, 2018, Volume 60, Issue 4, Pages 743–746
DOI: https://doi.org/10.1134/S106378341804011X
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: S. I. Gudkov, K. D. Baklanova, M. V. Kamenshchikov, A. V. Solnyshkin, A. N. Belov, “Electrical conductivity and barrier properties of lithium niobate thin films”, Fizika Tverdogo Tela, 60:4 (2018), 739–742; Phys. Solid State, 60:4 (2018), 743–746
Citation in format AMSBIB
\Bibitem{GudBakKam18}
\by S.~I.~Gudkov, K.~D.~Baklanova, M.~V.~Kamenshchikov, A.~V.~Solnyshkin, A.~N.~Belov
\paper Electrical conductivity and barrier properties of lithium niobate thin films
\jour Fizika Tverdogo Tela
\yr 2018
\vol 60
\issue 4
\pages 739--742
\mathnet{http://mi.mathnet.ru/ftt9239}
\crossref{https://doi.org/10.21883/FTT.2018.04.45685.09D}
\elib{https://elibrary.ru/item.asp?id=32739848}
\transl
\jour Phys. Solid State
\yr 2018
\vol 60
\issue 4
\pages 743--746
\crossref{https://doi.org/10.1134/S106378341804011X}
Linking options:
  • https://www.mathnet.ru/eng/ftt9239
  • https://www.mathnet.ru/eng/ftt/v60/i4/p739
    • This publication is cited in the following 1 articles:
    1. M. Sumets, V. Ievlev, V. Dybov, A. Kostyuchenko, D. Serikov, S. Kannykin, G. Kotov, E. Belonogov, “Electrical properties of amorphous films and crystallization of Li–Nb–O system on silicon”, J Mater Sci: Mater Electron, 30:16 (2019), 15662  crossref
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
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