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Fizika Tverdogo Tela, 2020, Volume 62, Issue 1, Pages 121–124
DOI: https://doi.org/10.21883/FTT.2020.01.48748.570
(Mi ftt8532)
 

This article is cited in 1 scientific paper (total in 1 paper)

Ferroelectricity

Conductivity of metal–dielectric–semiconductor structures based on ferroelectric films

M. S. Afanasieva, E. I. Goldmana, G. V. Chuchevaa, A. E. Nabiyevb, J. È. Huseynovb, N. Sh. Alievc

a Kotelnikov Institute of Radioengineering and Electronics, Fryazino Branch, Russian Academy of Sciences
b N. Tusi Azerbaijan State Pedagogical University, Baku, Azerbaijan
c Institute of radiation problems, ANAS, Baku, Azerbaijan
Full-text PDF (111 kB) Citations (1)
Abstract: In this paper, we present the results of experimental studies of the frequency and temperature dependences of the electrical conductivity of metal–dielectric–semiconductor structures based on ferroelectric films of the Ba$_{0.8}$Sr$_{0.2}$TiO$_{3}$ composition. In the temperature range of 290–400 K and the frequency range of 25–10$^6$ Hz, the conductivity was found to obey the $\sigma\propto f^{0.76}$ law, which is characteristic of the hopping mechanism of charge transfer over states localized near the Fermi level. The density of these states, average distance and time of jumps are estimated.
Keywords: metal–dielectric–semiconductor structures, ferroelectric films, barium–strontium titanate solid solutions, alternate current conductivity.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation
The work was performed as part of a state assignment.
Received: 19.08.2019
Revised: 19.08.2019
Accepted: 19.08.2019
English version:
Physics of the Solid State, 2020, Volume 62, Issue 1, Pages 164–167
DOI: https://doi.org/10.1134/S1063783420010035
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: M. S. Afanasiev, E. I. Goldman, G. V. Chucheva, A. E. Nabiyev, J. È. Huseynov, N. Sh. Aliev, “Conductivity of metal–dielectric–semiconductor structures based on ferroelectric films”, Fizika Tverdogo Tela, 62:1 (2020), 121–124; Phys. Solid State, 62:1 (2020), 164–167
Citation in format AMSBIB
\Bibitem{AfaGolChu20}
\by M.~S.~Afanasiev, E.~I.~Goldman, G.~V.~Chucheva, A.~E.~Nabiyev, J.~È.~Huseynov, N.~Sh.~Aliev
\paper Conductivity of metal--dielectric--semiconductor structures based on ferroelectric films
\jour Fizika Tverdogo Tela
\yr 2020
\vol 62
\issue 1
\pages 121--124
\mathnet{http://mi.mathnet.ru/ftt8532}
\crossref{https://doi.org/10.21883/FTT.2020.01.48748.570}
\elib{https://elibrary.ru/item.asp?id=42571196}
\transl
\jour Phys. Solid State
\yr 2020
\vol 62
\issue 1
\pages 164--167
\crossref{https://doi.org/10.1134/S1063783420010035}
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  • https://www.mathnet.ru/eng/ftt/v62/i1/p121
  • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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