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Fizika Tverdogo Tela, 2020, Volume 62, Issue 1, Pages 46–51
DOI: https://doi.org/10.21883/FTT.2020.01.48731.29ks
(Mi ftt8515)
 

This article is cited in 1 scientific paper (total in 1 paper)

International Conference "Mechanisms and Nonlinear Problems of Nucleation, Growth of Crystals and Thin Films", dedicated to the memory of the outstanding theoretical physicist Professor V.V. Slezov (Proceedings) Saint Petersburg, July 1-5, 2019
Surface physics, thin films

Synthesis of TiN, Ti and TiSi$_{2}$ thin films for the contact system of solar cells

K. Kh. Nussupov, N. B. Beisenkhanov, D. I. Bakranova, S. Keinbay, A. A. Turakhun, A. A. Sultan

Kazakh-British Technical University
Full-text PDF (735 kB) Citations (1)
Abstract: The influence of deposition parameters, such as: the magnetron power in the range 690–1400 W, the silicon substrate temperature 23–170$^{\circ}$C, the N$_2$ gas flow rate 0.9–3.6 L/h, the Ar gas flow rate 0.06–3.6 L/h, the ratio of N$_2$/Ar gas flows 1–60 on the thickness, the density, and the composition of the deposited films is analyzed. The maximum density 5.247 g/cm$^3$ corresponding to the TiN$_{0.786}$ = Ti$_{56}$N$_{44}$ composition has been achieved at the following deposition parameters: 1200 W, N/Ar = 1.8/0.06 L/h = 30, 0.8 Pa, 320 s, and 100$^{\circ}$C. At temperatures 700–800$^{\circ}$C, the mutual diffusion of titanium and silicon atoms through the interface leads to the active nucleation, the formation of nanocrystals and low-resistance metallization layers. X-ray diffraction shows that, during annealing at 700$^{\circ}$C (30 min, Ar), the formation of phase TiSi$_2$ due to the diffusion of Ti atoms into silicon is twice more intense than the formation of Ti$_5$Si$_3$ due to the diffusion of silicon atoms into titanium as a result of high hardness of titanium. The average sizes of TiSi$_2$ decreases from 7.1 to 5.6 nm at 750$^{\circ}$C due to the crystallization of the nuclei and increase to 9.2 nm at 800$^{\circ}$C.
Keywords: silicon, titanium, titanium nitride, diffusion barrier, solar cell.
Funding agency Grant number
Ministry of Education and Science of the Republic of Kazakhstan АР05130212
АР05133356
This work was supported by the Science Committee of the Ministry of Education and Science of the Republic of Kazakhstan (projects AR05130212, AR05133356, 2018–2020).
Received: 16.07.2019
Revised: 16.07.2019
Accepted: 25.07.2019
English version:
Physics of the Solid State, 2020, Volume 62, Issue 1, Pages 48–53
DOI: https://doi.org/10.1134/S1063783420010242
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: K. Kh. Nussupov, N. B. Beisenkhanov, D. I. Bakranova, S. Keinbay, A. A. Turakhun, A. A. Sultan, “Synthesis of TiN, Ti and TiSi$_{2}$ thin films for the contact system of solar cells”, Fizika Tverdogo Tela, 62:1 (2020), 46–51; Phys. Solid State, 62:1 (2020), 48–53
Citation in format AMSBIB
\Bibitem{NusBeiBak20}
\by K.~Kh.~Nussupov, N.~B.~Beisenkhanov, D.~I.~Bakranova, S.~Keinbay, A.~A.~Turakhun, A.~A.~Sultan
\paper Synthesis of TiN, Ti and TiSi$_{2}$ thin films for the contact system of solar cells
\jour Fizika Tverdogo Tela
\yr 2020
\vol 62
\issue 1
\pages 46--51
\mathnet{http://mi.mathnet.ru/ftt8515}
\crossref{https://doi.org/10.21883/FTT.2020.01.48731.29ks}
\elib{https://elibrary.ru/item.asp?id=42571178}
\transl
\jour Phys. Solid State
\yr 2020
\vol 62
\issue 1
\pages 48--53
\crossref{https://doi.org/10.1134/S1063783420010242}
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