This article is cited in 1 scientific paper (total in 1 paper)
International Conference "Mechanisms and Nonlinear Problems of Nucleation, Growth of Crystals and Thin Films", dedicated to the memory of the outstanding theoretical physicist Professor V.V. Slezov (Proceedings) Saint Petersburg, July 1-5, 2019 Surface physics, thin films
Synthesis of TiN, Ti and TiSi2 thin films for the contact system of solar cells
Abstract:
The influence of deposition parameters, such as: the magnetron power in the range 690–1400 W, the silicon substrate temperature 23–170∘C, the N2 gas flow rate 0.9–3.6 L/h, the Ar gas flow rate 0.06–3.6 L/h, the ratio of N2/Ar gas flows 1–60 on the thickness, the density, and the composition of the deposited films is analyzed. The maximum density 5.247 g/cm3 corresponding to the TiN0.786 = Ti56N44 composition has been achieved at the following deposition parameters: 1200 W, N/Ar = 1.8/0.06 L/h = 30, 0.8 Pa, 320 s, and 100∘C. At temperatures 700–800∘C, the mutual diffusion of titanium and silicon atoms through the interface leads to the active nucleation, the formation of nanocrystals and low-resistance metallization layers. X-ray diffraction shows that, during annealing at 700∘C (30 min, Ar), the formation of phase TiSi2 due to the diffusion of Ti atoms into silicon is twice more intense than the formation of Ti5Si3 due to the diffusion of silicon atoms into titanium as a result of high hardness of titanium. The average sizes of TiSi2 decreases from 7.1 to 5.6 nm at 750∘C due to the crystallization of the nuclei and increase to 9.2 nm at 800∘C.
Keywords:
silicon, titanium, titanium nitride, diffusion barrier, solar cell.
This work was supported by the Science Committee of the Ministry of Education and Science of the Republic of Kazakhstan (projects AR05130212, AR05133356, 2018–2020).
Citation:
K. Kh. Nussupov, N. B. Beisenkhanov, D. I. Bakranova, S. Keinbay, A. A. Turakhun, A. A. Sultan, “Synthesis of TiN, Ti and TiSi2 thin films for the contact system of solar cells”, Fizika Tverdogo Tela, 62:1 (2020), 46–51; Phys. Solid State, 62:1 (2020), 48–53
\Bibitem{NusBeiBak20}
\by K.~Kh.~Nussupov, N.~B.~Beisenkhanov, D.~I.~Bakranova, S.~Keinbay, A.~A.~Turakhun, A.~A.~Sultan
\paper Synthesis of TiN, Ti and TiSi$_{2}$ thin films for the contact system of solar cells
\jour Fizika Tverdogo Tela
\yr 2020
\vol 62
\issue 1
\pages 46--51
\mathnet{http://mi.mathnet.ru/ftt8515}
\crossref{https://doi.org/10.21883/FTT.2020.01.48731.29ks}
\elib{https://elibrary.ru/item.asp?id=42571178}
\transl
\jour Phys. Solid State
\yr 2020
\vol 62
\issue 1
\pages 48--53
\crossref{https://doi.org/10.1134/S1063783420010242}
Linking options:
https://www.mathnet.ru/eng/ftt8515
https://www.mathnet.ru/eng/ftt/v62/i1/p46
This publication is cited in the following 1 articles: