Abstract:
The development of new dielectric materials for insulating layer of interconnects with low loss on high frequencies (low-k) is one of main directions of modern microelectronics. At present, various modifications of SiO2-based dielectric structures standard for modern integrated circuits differ in composition and morphological characteristics are being studied. In this work, the dielectric loss of thin-film SiO2 samples on Al substrate are studied by methods of terahertz (THz) and IR spectroscopy. It is found that the spectra of such structures are substantially different, including the resonant Berreman modes, as compared to the spectra of a bulk fused silica.
Keywords:
dielectric spectroscopy, terahertz range, time domain spectrometer, dielectric losses.
Citation:
G. A. Komandin, V. S. Nozdrin, A. A. Pronin, O. E. Porodinkov, V. B. Anzin, I. E. Spektor, “Dielectric loss of thin-film SiO2 samples on Al in THz-IR range”, Fizika Tverdogo Tela, 62:2 (2020), 223–228; Phys. Solid State, 62:2 (2020), 267–272
\Bibitem{KomNozPro20}
\by G.~A.~Komandin, V.~S.~Nozdrin, A.~A.~Pronin, O.~E.~Porodinkov, V.~B.~Anzin, I.~E.~Spektor
\paper Dielectric loss of thin-film SiO$_{2}$ samples on Al in THz-IR range
\jour Fizika Tverdogo Tela
\yr 2020
\vol 62
\issue 2
\pages 223--228
\mathnet{http://mi.mathnet.ru/ftt8489}
\crossref{https://doi.org/10.21883/FTT.2020.02.48871.584}
\elib{https://elibrary.ru/item.asp?id=42571215}
\transl
\jour Phys. Solid State
\yr 2020
\vol 62
\issue 2
\pages 267--272
\crossref{https://doi.org/10.1134/S1063783420020158}
Linking options:
https://www.mathnet.ru/eng/ftt8489
https://www.mathnet.ru/eng/ftt/v62/i2/p223
This publication is cited in the following 3 articles:
G A Komandin, V S Nozdrin, N V Chernomyrdin, D S Seregin, A S Vishnevskiy, V N Kurlov, K A Vorotilov, A V Miakonkikh, A A Lomov, K V Rudenko, I E Spektor, “Dielectric permittivity of organosilicate glass thin films on a sapphire substrate determined using time-domain THz and Fourier IR spectroscopy”, J. Phys. D: Appl. Phys., 55:2 (2022), 025303
Patricia Aguilar-Merino, Gonzalo Álvarez-Pérez, Javier Taboada-Gutiérrez, Jiahua Duan, Iván Prieto, Luis Manuel Álvarez-Prado, Alexey Y. Nikitin, Javier Martín-Sánchez, Pablo Alonso-González, “Extracting the Infrared Permittivity of SiO2 Substrates Locally by Near-Field Imaging of Phonon Polaritons in a van der Waals Crystal”, Nanomaterials, 11:1 (2021), 120
Gennadiy A Komandin, Vadim S Nozdrin, Igor E Spektor, Oleg E Porodinkov, Dmitry S Seregin, Alexey S Vishnevskiy, Konstantin A Vorotilov, Alexander S Sigov, “Dielectric contribution of the IR absorption bands of porous organosilicate glass thin films on a platinum sublayer”, J. Phys. D: Appl. Phys., 54:21 (2021), 215304
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