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Electron-paramagnetic-res and dlts comparative study of process of dislocation silicon dangling bond annealing
M. N. Zolotukhin, V. V. Kveder, Yu. A. Osip'yan, I. R. Sagdeev Institute of Solid State Physics of the Academy of Sciences SSSR
Received: 28.12.1983
Citation:
M. N. Zolotukhin, V. V. Kveder, Yu. A. Osip'yan, I. R. Sagdeev, “Electron-paramagnetic-res and dlts comparative study of process of dislocation silicon dangling bond annealing”, Fizika Tverdogo Tela, 26:5 (1984), 1412–1418
Linking options:
https://www.mathnet.ru/eng/ftt2881 https://www.mathnet.ru/eng/ftt/v26/i5/p1412
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Abstract page: | 65 | Full-text PDF : | 31 |
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