Surface modification of silica glass by pulses of a picosecond laser

An experimental laser system for studying the processes of micro– and nanostructure direct formation in a silica glass by picosecond laser pulses is described. A method of ablation monitoring based on the Shack-Hartmann wavefront sensor is proposed. Ablation craters on the surface of the silica glass varying in depth from $23 \pm 4 nm $ to $144 \pm 18 nm $ with good edge quality with the power density varying from $0,57 \times 1012$ to $31 \times 1012$ W/cm$^2$, respectively, are synthesized. Higher-intensity modes of laser processing lead to the formation of cracks and chips on the surface of the material, with lower-intensity processing leading to the appearance of melting edges. The obtained structures are characterized using an atomic force microscope. The ablation rate of the silica glass is established.