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This article is cited in 3 scientific papers (total in 3 papers)
OPTO-IT
Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors
V. P. Korolkov, A. S. Konchenko, V. V. Cherkashin, N. G. Mironnikov Institute of Automation and Electrometry SB RAS, Novosibirsk, Russia
Abstract:
A process of manufacturing conformal correctors for solid state YAG:Nd3+ lasers is discussed. It is proposed that a maskless lithography method should be used for fabricating a photoresist film with a desired thickness profile as an alternative to the proximity lithography based on half-tone masks. The use of a specular spectral scatterometry method for the testing of the conformal corrector shape at an early stage of photoresist profile formation is reported. A combination of these two methods makes the corrector manufacturing process significantly cheaper and faster.
Keywords:
specular spectral scatterometry, maskless lithography, conformal correctors, thin film thickness measurement, profilometry.
Received: 30.05.2016 Accepted: 16.08.2016
Citation:
V. P. Korolkov, A. S. Konchenko, V. V. Cherkashin, N. G. Mironnikov, “Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors”, Computer Optics, 40:4 (2016), 482–488
Linking options:
https://www.mathnet.ru/eng/co242 https://www.mathnet.ru/eng/co/v40/i4/p482
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Abstract page: | 172 | Full-text PDF : | 62 | References: | 33 |
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