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SHORT MESSAGE
Precision laser recording of microstructures on molybdenum films for generating a diffractive microrelief
S. D. Poletayevab, S. G. Volotovskyab a Samara National Research University, Samara, Russia
b Image Processing Systems Institute îf RAS,– Branch of the FSRC “Crystallography and Photonics” RAS, Samara, Russia
Abstract:
We discuss a problem of reducing the thickness of lines of the contact pattern masks produced by laser ablation of thin films of refractory metals and used when synthesizing the micro-relief of diffractive optical elements (DOEs). For a contact mask for a DOE on molybdenum, patterns with features in the range 0.25-0.3 $µ$m were recorder by laser ablation on 40-nm thick films. This is approximately 3 times smaller than the characteristic dimensions obtained by thermochemical recording chromium films of the same thickness in the standard process. A microrelief of height of up to 300 nm was formed in a quartz substrate by reactive ion etching in an inductively coupled plasma through the mask. We show that thin molybdenum films can have promising applications as metallic masks when synthesizing a DOE microrelief.
Keywords:
diffractive microrelief, metallic mask, laser ablation, thermochemical recording, molybdenum film, reactive ion etching.
Received: 02.06.2016 Accepted: 24.06.2016
Citation:
S. D. Poletayev, S. G. Volotovsky, “Precision laser recording of microstructures on molybdenum films for generating a diffractive microrelief”, Computer Optics, 40:3 (2016), 422–426
Linking options:
https://www.mathnet.ru/eng/co160 https://www.mathnet.ru/eng/co/v40/i3/p422
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Abstract page: | 160 | Full-text PDF : | 52 | References: | 25 |
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