Analytical design of mirrors generating prescribed two-dimensional intensity distributions

A new variant of source-to-target mapping for the design of mirrors generating prescribed twodimensional intensity distributions is presented. Design examples show high performance of the proposed technique: for rectangular and elliptical uniform intensity patterns of the angular size varying from $80^\circ \times 20^\circ$ to $40^\circ \times 20^\circ$ the relative error is less than $8.5\%$.