Investigation of thin films MgAl$_{2}$O$_{4}$, deposited on the si substrates by vacuum thermal evaporation

The article presents data on the study of X-ray structural and microstructural characteristics of thin films of aluminum-magnesium spinel MgAl$_{2}$O$_{4}$ deposited on Si substrates by vacuum thermal evaporation. MgAl$_{2}$O$_{4}$ films have a polycrystalline rhombic structure. The values of the unit cell parameters of MgAl$_{2}$O$_{4}$ are calculated. Scanning electron and atomic force microscopy showed that MgAl$_{2}$O$_{4}$ films have a densely packed structure without cracks. Physical characteristics and good adhesion of MgAl$_{2}$O$_{4}$ thin films to silicon substrates indicate their possibility of using in devices of opto- and microelectronics.