Simulation of the deposition process on a substrate nanofilms of porous alumina

In the paper formulation of the problem and describe the study of deposition of nanofilms on porous alumina substrate are shown. The equations of the modified embedded atom method are considered. These equations are the basis of many-particle interaction potential of atoms. Various elements of the Mendeleev periodic system are used as deposition materials. Various mechanisms overgrowth of a porous substrate of alumina are obtained. Recommendations for obtaining of nanofilms materials of different structures are formulated.